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المؤلفون: Stuart Sherwin
المصدر: International Conference on Extreme Ultraviolet Lithography 2022.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fab02a9a90f3f3ec08f0ef05679a1fb9
https://doi.org/10.1117/12.2643550 -
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المؤلفون: Stuart Sherwin, Ryan Miyakawa, Eric Gullikson, Laura Waller, Andrew Neureuther, Patrick Naulleau
المصدر: Optical and EUV Nanolithography XXXV.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::232d73b6bfc49d7ecc5a628014e24e1f
https://doi.org/10.1117/12.2617291 -
3
المؤلفون: Eric Li, Stuart Sherwin, Gautam Gunjala, Laura Waller
المصدر: Optics Continuum. 2:119
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bda864686af55354de99e8cf966892a8
https://doi.org/10.1364/optcon.475990 -
4
المؤلفون: Markus P. Benk, Andrew R. Neureuther, Laura Waller, Stuart Sherwin, Isvar A. Cordova, Ryan Miyakawa, Patrick P. Naulleau
المصدر: Extreme Ultraviolet Lithography 2020.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Phase (waves), Picometre, Metrology, Optics, Extreme ultraviolet, Etching, Monolayer, Phase-shift mask, Sensitivity (control systems), business, Reflectometry
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d299058def0c28c83123efe7473b2897
https://doi.org/10.1117/12.2574759 -
5
المؤلفون: Laura Waller, Aamod Shanker, Stuart Sherwin, Markus P. Benk, Gautam Gunjala, Patrick P. Naulleau, Antoine Wojdyla, Kenneth A. Goldberg
المصدر: Scientific reports, vol 10, iss 1
Scientific Reports
Scientific Reports, Vol 10, Iss 1, Pp 1-11 (2020)مصطلحات موضوعية: Accuracy and precision, Microscope, Materials science, lcsh:Medicine, 02 engineering and technology, Surface finish, 01 natural sciences, Article, law.invention, 010309 optics, Optics, law, 0103 physical sciences, Surface roughness, Optical techniques, lcsh:Science, Wavefront, Multidisciplinary, business.industry, lcsh:R, Computational science, 021001 nanoscience & nanotechnology, Characterization (materials science), Extreme ultraviolet, lcsh:Q, Photomask, 0210 nano-technology, business
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f12fc3c93e782aa120a67912a9b91c5
https://escholarship.org/uc/item/4pd3p2hw -
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المؤلفون: Andrew R. Neureuther, Laura Waller, Isvar A. Cordova, Stuart Sherwin, Ryan Miyakawa, Patrick P. Naulleau
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Physics, Image quality, Zernike polynomials, business.industry, Extreme ultraviolet lithography, Grating, Metrology, symbols.namesake, Optics, symbols, Photomask, Phase retrieval, Reflectometry, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::299128a9c96c7d8a3a0af809468d7718
https://doi.org/10.1117/12.2552967 -
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المصدر: International Conference on Extreme Ultraviolet Lithography 2019.
مصطلحات موضوعية: Wavelength, Optics, Materials science, Amplitude, business.industry, Extreme ultraviolet lithography, Phase (waves), Photomask, Phase retrieval, business, Reflectometry, Ray
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2024c50c3a0d6e4c134a3348396721c9
https://doi.org/10.1117/12.2538107 -
8
المصدر: Extreme Ultraviolet (EUV) Lithography X.
مصطلحات موضوعية: Optical efficiency, Dipole, Materials science, Optics, Stack (abstract data type), business.industry, Aperiodic graph, Extreme ultraviolet lithography, Specular reflection, Photomask, business, Reflectivity
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::271983af92aa072f56282d2d65e1cd11
https://doi.org/10.1117/12.2515095 -
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المؤلفون: Patrick P. Naulleau, Andrew R. Neureuther, Stuart Sherwin
المصدر: International Conference on Extreme Ultraviolet Lithography 2018.
مصطلحات موضوعية: Diffraction, Optics, Materials science, business.industry, Extreme ultraviolet lithography, Reflection (physics), Grating, Reflection coefficient, Photomask, business, Rigorous coupled-wave analysis, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6f9cbaa0c2b7e48ddfe5359dcf1cec56
https://doi.org/10.1117/12.2501970 -
10
المؤلفون: Andrew R. Neureuther, Patrick P. Naulleau, Stuart Sherwin
المصدر: Extreme Ultraviolet (EUV) Lithography IX.
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Scattering, Extreme ultraviolet lithography, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Integrated circuit layout, Light scattering, law.invention, Optics, law, 0103 physical sciences, Photomask, Photolithography, 0210 nano-technology, Rigorous coupled-wave analysis, business, Phase retrieval
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ebd9bb8166d94a557f7fb00c2e77609b
https://doi.org/10.1117/12.2299271