المؤلفون: Short, M., Müller, J., Lee, S., Fornasier, H., Köhler, U., Ott, V., Stüber, M., Gerdes, B., Rupp, T., Kirchlechner, C., Woll, K.

المصدر: In Materials & Design May 2023 229

المؤلفون: Ganesan, R., Fernandez-Martinez, I., Akhavan, B., Matthews, D.T.A., Sergachev, D., Stueber, M., McKenzie, D.R., Bilek, M.M.M.

المصدر: In Surface & Coatings Technology 15 February 2023 454

المؤلفون: Neuhauser, T., Tinti, G., Leiste, H., Casati, N., Stüber, M., Woll, K.

المصدر: In Acta Materialia 15 August 2020 195:579-587

المؤلفون: Landälv, Ludvig, 1982, Lu, Jun, 1962, Spitz, S., Leiste, H., Ulrich, S., Johansson, Mats P., 1965, Ahlgren, M., Gothelid, E., Alling, Björn, 1980, Hultman, Lars, Professor, 1960, Stueber, M., Eklund, Per, Docent, 1977

المصدر: Acta Materialia. 131:543-552

مصطلحات موضوعية: Chromium zirconium oxide, Eskolaite, RF magnetron sputtering, Annealing, TEM

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-138476
https://liu.diva-portal.org/smash/get/diva2:1111723/FULLTEXT01.pdf

المؤلفون: Seifried, F., Leiste, H., Schwaiger, R., Ulrich, S., Seifert, H.J., Stueber, M.

المصدر: In Surface & Coatings Technology 15 August 2018 347:379-389

المؤلفون: Tang, C., Klimenkov, M., Jaentsch, U., Leiste, H., Rinke, M., Ulrich, S., Steinbrück, M., Seifert, H.J., Stueber, M.

المصدر: In Surface & Coatings Technology 15 January 2017 309:445-455

المؤلفون: Ulrich, Sven^Aff1_55, Klever, C.^Aff1_55, Leiste, H.^Aff1_55, Seemann, K.^Aff1_55, Stüber, M.^Aff1_55

المساهمون: Reithmaier, Johann Peter, editor^AffID1, Paunovic, Perica, editor^AffID2, Kulisch, Wilhelm, editor^AffID3, Popov, Cyril, editor^AffID4, Petkov, Plamen, editor^AffID5

المصدر: Nanotechnological Basis for Advanced Sensors. :519-527

المؤلفون: Vasilchina, H.^Aff4, Popov, C.^Aff1, Ulrich, S.^Aff4, YE, J.^Aff4, Danneil, F.^Aff4, StÜber, M.^Aff4, Welle, A.^Aff5

المساهمون: Reithmaier, Johann Peter, editor^Aff1, Petkov, Plamen, editor^Aff2, Kulisch, Wilhelm, editor^Aff3, Popov, Cyril, editor^Aff1

المصدر: Nanostructured Materials for Advanced Technological Applications. :501-508

المؤلفون: Ketterer, B.^Aff4, Vasilchina, H.^Aff4, Ulrich, S.^Aff4, StÜBer, M.^Aff4, Leiste, H.^Aff4, Adelhelm, C.^Aff4, Kaiser, T.^Aff4, Schimmel, Th.^Aff5

المساهمون: Reithmaier, Johann Peter, editor^Aff1, Petkov, Plamen, editor^Aff2, Kulisch, Wilhelm, editor^Aff3, Popov, Cyril, editor^Aff1

المصدر: Nanostructured Materials for Advanced Technological Applications. :405-409

المؤلفون: Ulrich, S.^Aff4, Holleck, H.^Aff4, StÜBer, M.^Aff4, Leiste, H.^Aff4, Ye, J.^Aff4, Ziebert, C.^Aff4

المساهمون: Reithmaier, Johann Peter, editor^Aff1, Petkov, Plamen, editor^Aff2, Kulisch, Wilhelm, editor^Aff3, Popov, Cyril, editor^Aff1

المصدر: Nanostructured Materials for Advanced Technological Applications. :257-267