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المؤلفون: Eric Kwon, Bill Kalsbeck, Paul Chung, Wonil Cho, Suein Son, Gregg Inderhees, Il-Yong Jang, Chan-Uk Jeon, Jiuk Hur, JeongHun Seo, Min Choo, Alexander Tan, In-Yong Kang
المصدر: Photomask Technology 2018.
مصطلحات موضوعية: Flexibility (engineering), business.industry, Computer science, Extreme ultraviolet lithography, Reticle, Process (computing), Wafer, Node (circuits), business, Throughput (business), Blank, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0fca639f9b742a35121801bb0aeeaf95
https://doi.org/10.1117/12.2511160 -
2مؤتمر
المؤلفون: Inderhees, Gregg, Kalsbeck, Bill, Tan, Alexander, Paul Chung, JiUk Hur, Kwon, Eric, Min Choo, Wonil Cho, Chan-Uk Jeon, IlYong Jang, In-Yong Kang, JeongHun Seo, Suein Son
المصدر: Proceedings of SPIE; 8/26/2018, Vol. 10810, p1081017-1-1081017-10, 10p