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1مؤتمر
المؤلفون: Sug Hun Hong, Jae Hyuck Jang, Tae Joo Park, Doo Seok Jeong, Miyoung Kim, Cheol Seong Hwang
المصدر: Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005. Solid-State Device Research Conference Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European. :517-520 2005
Relation: Proceedings of ESSDERC 2005. 31st European Solid-State Device Research Conference
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2دورية أكاديمية
المؤلفون: Jaehoo Park, Tae Joo Park, Moonju Cho, Seong Keun Kim, Sug Hun Hong, Jeong Hwan Kim, Minha Seo, Cheol Seong Hwang, Jeong Yeon Won, Ranju Jeong, Jung-Hae Choi
المصدر: Journal of Applied Physics; 5/1/2006, Vol. 99 Issue 9, p094501, 8p, 2 Charts, 7 Graphs
مصطلحات موضوعية: POLYCRYSTALS, OXYGEN, TRANSISTORS, DIELECTRIC films, THIN films in electrical insulation
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3
المؤلفون: Cheol Seong Hwang, Jeong Hwan Kim, Tae Joo Park, Sug Hun Hong, Minha Seo
المصدر: ECS Transactions. 1:419-424
مصطلحات موضوعية: Materials science, Chemical engineering, Interface (Java), Chemical structure, Trap density, Layer (electronics), Deposition temperature
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4
المؤلفون: Tae Joo Park, Jae Hyuck Jang, Jeong Hwan Kim, C.S. Hwang, Minha Seo, Sug Hun Hong
المصدر: ECS Transactions. 1:3-7
مصطلحات موضوعية: Permittivity, Atomic layer deposition, Materials science, Electronic engineering, Leakage current density, Composite material, Layer (electronics), Capacitance, Deposition (law), Shrinkage, High-κ dielectric
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5
المؤلفون: Jung-Yeon Won, Tae Joo Park, Cheol Seong Hwang, R.J Jung, Jeong Hwan Kim, Min Ju Cho, Sug Hun Hong, Seong Keun Kim
المصدر: ECS Transactions. 1:257-266
مصطلحات موضوعية: In situ, Materials science, Electrical performance, Thermal stability, Composite material, Layer (electronics), High-κ dielectric
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6
المؤلفون: Sang Ryol Yang, Tae Joo Park, J.H. Heo, Hyuck J. Jang, Sug Hun Hong, Cheol Seong Hwang, Mi-Hwa Kim
المصدر: ECS Transactions. 1:393-397
مصطلحات موضوعية: Materials science, Thermal stability, Metalorganic vapour phase epitaxy, Composite material, Layer (electronics)
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7
المؤلفون: Jaehoo Park, Jeong Hwan Kim, Sug Hun Hong, Seong Keun Kim, Cheol Seong Hwang, Suk Woo Lee, Moonju Cho, Tae Joo Park
المصدر: Microelectronic Engineering. 80:222-225
مصطلحات موضوعية: Permittivity, Interfacial reaction, Materials science, Annealing (metallurgy), Binary alloy, chemistry.chemical_element, Germanium, Condensed Matter Physics, Capacitance, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Reaction interface, Chemical engineering, chemistry, Electrical and Electronic Engineering, High-κ dielectric
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8
المؤلفون: Suk Woo Lee, Doo Seok Jeong, Jaehoo Park, Chihoon Lee, Hong-bae Park, Cheol Seong Hwang, Tae Joo Park, Sug Hun Hong, Moonju Cho
المصدر: Applied Physics Letters. 85:5965-5967
مصطلحات موضوعية: Suboxide, Materials science, Physics and Astronomy (miscellaneous), Silicon, business.industry, Analytical chemistry, chemistry.chemical_element, engineering.material, Threshold voltage, Atomic layer deposition, Polycrystalline silicon, chemistry, Vacuum deposition, MOSFET, engineering, Optoelectronics, Field-effect transistor, business
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9
المؤلفون: Sang-Bom Kang, Joo-Tae Moon, In Sang Jeon, Si-Young Choi, U-In Chung, Kab-Jin Nam, Dong Chan Kim, Byung-Il Ryu, Hye-Lan Lee, Ji-Hyun Kim, Soo-Ik Jang, Sang-Jin Hyun, Sug-hun Hong, Hye-min Kim
المصدر: 2007 IEEE Symposium on VLSI Technology.
مصطلحات موضوعية: Materials science, business.industry, Gate dielectric, Hardware_PERFORMANCEANDRELIABILITY, Propagation delay, Dielectric, law.invention, Capacitor, CMOS, law, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Inverter, Optoelectronics, Data retention, business, Dram, Hardware_LOGICDESIGN
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::162ab452f25fe75ebe824dfbc11216b3
https://doi.org/10.1109/vlsit.2007.4339685 -
10
المؤلفون: Jae Hyuck Jang, Sug Hun Hong, Cheol Seong Hwang, Doo Seok Jeong, Miyoung Kim, Tae Joo Park
المصدر: Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005..
مصطلحات موضوعية: Atomic layer deposition, Materials science, business.industry, Gate dielectric, Analytical chemistry, Rectangular potential barrier, Optoelectronics, Dielectric, business, Flash memory, Quantum tunnelling, Leakage (electronics), High-κ dielectric
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::379498489da33daf408215c60e280839
https://doi.org/10.1109/essder.2005.1546698