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1
المؤلفون: Chimaobi Mbanaso, Yunfei Wang, Yu-Jen Fan, Petros Thomas, Sungmin Huh, Alin Antohe, Ken Goldberg, Leonid Yankulin, Patrick P. Naulleau, Gregory Denbeaux, Iacopo Mochi, Andrea Wüest, Rashi Garg, Frank Goodwin
المصدر: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:321-328
مصطلحات موضوعية: Materials science, Carbon contamination, business.industry, Process Chemistry and Technology, Extreme ultraviolet lithography, chemistry.chemical_element, Contamination, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Optics, Resist, chemistry, Extreme ultraviolet, Materials Chemistry, Optoelectronics, Electrical and Electronic Engineering, business, Instrumentation, Lithography, Critical dimension, Carbon
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2
المؤلفون: Seno Rekawa, Patrick P. Naulleau, Kenneth A. Goldberg, Hak-Seung Han, C. D. Kemp, Iacopo Mochi, Sungmin Huh, E. H. Anderson, R. F. Gunion
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2220-2224
مصطلحات موضوعية: Physics, business.industry, Extreme ultraviolet lithography, Charge coupled device camera, Mask inspection, Condensed Matter Physics, law.invention, Numerical aperture, Lens (optics), Optics, law, Extreme ultraviolet, Optoelectronics, Electrical and Electronic Engineering, business, Image resolution, Aerial image
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3
المؤلفون: Hwan-Seok Seo, Dong-Gun Lee, Han-Ku Cho, Byung-Sup Ahn, Eric M. Gullikson, Sungmin Huh, Seong-Sue Kim, Hak-Seung Han, Hoon Kim, Dong Wan Kim
المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2208-2214
مصطلحات موضوعية: Materials science, business.industry, Scattering, Extreme ultraviolet lithography, engineering.material, Condensed Matter Physics, Wavelength, Optics, Resist, Coating, Microscopy, engineering, Optoelectronics, Wafer, Electrical and Electronic Engineering, business, Refractive index
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4
المؤلفون: Ying Li, Il-Yong Jang, Sungmin Huh, Ranganath Teki, Danping Peng, Vibhu Jindal, Masaki Satake, Seong-Sue Kim, Frank Goodwin
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Materials science, Optics, Dimension (vector space), business.industry, Extreme ultraviolet lithography, Phase (waves), Conformal map, Wafer, Luminescence, business, Algorithm, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8ae64b988a3824386785c60cb63d1bad
https://doi.org/10.1117/12.2028069 -
5
المؤلفون: Danping Peng, Ying Li, Ranganath Teki, Il-Yong Jang, Vibhu Jindal, Sungmin Huh, Masaki Satake, Frank Goodwin, Seong-Sue Kim
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Cross section (physics), Scanner, Materials science, Optics, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Phase (waves), Conformal map, Wafer, business, Critical dimension
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f4806e50ec82886bd32cd7c4740741b8
https://doi.org/10.1117/12.2011493 -
6
المؤلفون: Dong Ryul Lee, Gregg Inderhees, Chan-Uk Jeon, Jinho Ahn, Jihoon Na, In Yong Kang, Jonggul Doh, Chang Young Jeong, Seong Sue Kim, Sungmin Huh, Hwan Seok Seo
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, Computer data storage, Optoelectronics, Mask inspection, Wafer, Defect free, business, Blank, High volume manufacturing
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::819ace1f1ad30342cbd54805b1dd4ac7
https://doi.org/10.1117/12.916021 -
7
المؤلفون: Sungmin Huh, Tae-Geun Kim, Hwan-Seok Seo, Seong-Sue Kim, Chang Young Jeong, In-Yong Kang, Kenneth A. Goldberg, Chan-Uk Jeon, Jihoon Na, Iacopo Mochi
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Optics, Fabrication, Materials science, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Optoelectronics, Node (circuits), Wafer, Mask inspection, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d620ee548e63e43d44ff2b94176f2996
https://doi.org/10.1117/12.916052 -
8
المؤلفون: Sungmin Huh, Ken Goldberg, Gregg Inderhees, Hwan-Seok Seo, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho, Joo-On Park, Sang-Hyun Kim, Tsutomu Shoki, In-Yong Kang, Iacopo Mochi
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Fabrication, Materials science, business.industry, Extreme ultraviolet lithography, Mascara, Blank, law.invention, Optics, Stack (abstract data type), law, Extreme ultraviolet, Optoelectronics, Wafer, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fc948daa09482ce892826c0c3762a84c
https://doi.org/10.1117/12.879384 -
9
المؤلفون: C.H. Shin, Dongwha Lee, H.Y. Cho, Kwang-II Park, Sungmin Huh, Dong Wook Kwak, Dong-Hoon Kim
المصدر: 2010 35th IEEE Photovoltaic Specialists Conference.
مصطلحات موضوعية: Materials science, Passivation, Silicon, chemistry, Sputtering, Nitrogen plasma, Analytical chemistry, Dominant negative, chemistry.chemical_element, Flat band, Nitrogen effect, Nitrogen
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::77bf6165da9f75a001b21cb55d7604e2
https://doi.org/10.1109/pvsc.2010.5614520 -
10
المؤلفون: Iacopo Mochi, Sang-In Han, Joo-On Park, Sungmin Huh, Byung-Sup Ahn, Stefan Wurm, Toshio Nakajima, Liping Ren, Ken Goldberg, David Chan, Kyoungyong Cho, Masahiro Kishimoto, Thomas Laursen, In-Yong Kang
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Fabrication, Materials science, business.industry, Extreme ultraviolet lithography, Mask inspection, Blank, law.invention, Optics, Stack (abstract data type), law, Extreme ultraviolet, Optoelectronics, Wafer, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c726be4fe0a2af6e3ff59d55df5d7236
https://doi.org/10.1117/12.846922