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1مؤتمر
المؤلفون: Hoon Lim, Seung-Jae Lee, Jong-Mil Youn, Tae-Hong Ha, Jin-Ho Kim, Bong-Hyun Choi, Ki-Joon Kim, Ho-Jin Kim, Kyeong-Tae Kim, Hyun-Geun Byun
المصدر: 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167) Reliability physics symposium Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International. :48-51 2001
Relation: 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual
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المؤلفون: Jin Hee Park, Jonathan R. Bakke, Mark Lee, Shashank Sharma, Nam-Sung Kim, Ellie Yeh, Tae Hong Ha, Jianxin Lei, Wenting Hou, Raymond Hung, Amir Wachs, Karthik Raman Sharma
المصدر: 2018 IEEE International Interconnect Technology Conference (IITC).
مصطلحات موضوعية: 010302 applied physics, Materials science, Silicon, Annealing (metallurgy), business.industry, Contact resistance, chemistry.chemical_element, 02 engineering and technology, Dielectric, Chemical vapor deposition, Tungsten, 021001 nanoscience & nanotechnology, 01 natural sciences, chemistry, 0103 physical sciences, Optoelectronics, 0210 nano-technology, business, Cobalt, Scaling
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::eb0150ad1624fc756a3529a32218e17e
https://doi.org/10.1109/iitc.2018.8430434 -
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المؤلفون: Mehul Naik, He Ren, Mark Lee, Zhiyuan Wu, Jin Hee Park, Jianshe Tang, You Wang, Jonathan R. Bakke, Nikolaos Bekiaris, Tae Hong Ha, Max Gage, Wenting Hou
المصدر: 2017 IEEE International Interconnect Technology Conference (IITC).
مصطلحات موضوعية: 010302 applied physics, Interconnection, Materials science, 020209 energy, Copper interconnect, chemistry.chemical_element, Time-dependent gate oxide breakdown, 02 engineering and technology, 01 natural sciences, Engineering physics, Electromigration, Conductor, chemistry, Electrical resistivity and conductivity, 0103 physical sciences, 0202 electrical engineering, electronic engineering, information engineering, Electronic engineering, Tin, Cobalt
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f4a949f4175fea3abc4fdc311c162b18
https://doi.org/10.1109/iitc-amc.2017.7968981 -
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المؤلفون: C.Y. Chang, Wonsuk Cho, Tae-Hong Ha, Bonghyun Choi, Kinam Kim, Hoon Lim, Jai-kyun Park, Soon-Moon Jung, Hoosung Cho, Jae-Hun Jeong, Han-Byung Park, Byoungkeun Son, Young-Seop Rah
المصدر: Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005..
مصطلحات موضوعية: Ultra high density, Materials science, Silicon, business.industry, CPU cache, Transistor, Sram cell, Electrical engineering, chemistry.chemical_element, law.invention, chemistry, law, Thin-film transistor, Optoelectronics, Static random-access memory, business, Single crystal
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::13e9b4699d38e9e611d6431ab3ac9e47
https://doi.org/10.1109/essder.2005.1546707 -
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المؤلفون: C.Y. Chang, Bonghyun Choi, Hoosung Cho, Hoon Lim, Han-Byung Park, Byoungkeun Son, Jongho Yun, Wonsuk Cho, Tae-Hong Ha, Seung-Chul Lee, Young-Seop Rah, Jae-Hun Jeong, Jae-Hoon Jang, Kinam Kim, Jai-kyun Park, Soon-Moon Jung
المصدر: Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005..
مصطلحات موضوعية: Materials science, business.industry, Transistor, Electrical engineering, Hardware_PERFORMANCEANDRELIABILITY, Salicide, law.invention, PMOS logic, CMOS, law, Gate oxide, MOSFET, Optoelectronics, Static random-access memory, business, NMOS logic
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b43a830ec3802193ec30ae5cc91eb6bd
https://doi.org/10.1109/.2005.1469275 -
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المؤلفون: Hyun-Geun Byun, Hoon Lim, Bonghyun Choi, Ki-Joon Kim, Tae-Hong Ha, Ho-Jin Kim, Seung-jae Lee, Jin-Ho Kim, Kyeong-Tae Kim, Jong-Mil Youn
المصدر: 2001 IEEE International Reliability Physics Symposium Proceedings. 39th Annual (Cat. No.00CH37167).
مصطلحات موضوعية: Materials science, Fabrication, business.industry, Oxide, Stress (mechanics), chemistry.chemical_compound, Reliability (semiconductor), chemistry, Shallow trench isolation, Chemical-mechanical planarization, Electronic engineering, Optoelectronics, Breakdown voltage, Degradation (geology), business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::20e3959e83ba7de0a9150974ca3978c6
https://doi.org/10.1109/relphy.2001.922880