يعرض 1 - 6 نتائج من 6 نتيجة بحث عن '"Takakuwa, Manabu"', وقت الاستعلام: 0.80s تنقيح النتائج
  1. 1
    مؤتمر
    Novel overlay correction by synchronizing scan speed to intra-die fingerprint on lithography scanner

    المؤلفون: Hamasaki, Masakazu, Hagio, Yoshinori, Kasa, Kentaro, Kato, Yoshimitsu, Takakuwa, Manabu, Obata, Tsutomu, Nakao, Shunichi, Miyake, Manabu, Kato, Katsuya, Takahata, Yosuke, Nakae, Akihiro

    المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2020 31st Annual. :1-6 Aug, 2020

    Relation: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

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  2. 2
    مؤتمر
    Overlay improvement for semiconductor manufacturing using Moiré effect

    المؤلفون: Hagio, Yoshinori, Kasa, Kentaro, Kawadahara, Sho, Takakuwa, Manabu, Takahata, Yosuke, Kato, Katsuya, Nakae, Akihiro

    المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2020 31st Annual. :1-5 Aug, 2020

    Relation: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

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  3. 3
    مؤتمر
    Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates.

    المؤلفون: Takakuwa, Manabu, Toriumi, Keigo, Komine, Nobuhiro, Ishigo, Kazutaka, Kono, Takuya, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

    المصدر: Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72720J-72720J-9, 9p

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  4. 4
    مؤتمر
    Feasibility of ultra-low k1 lithography for 28nm CMOS node.

    المؤلفون: Mimotogi, Shoji, Takahata, Kazuhiro, Murakami, Takashi, Nagahara, Seiji, Takeda, Kazuhiro, Satake, Masaki, Kitamura, Yosuke, Ojima, Tomoko, Fujise, Hiroharu, Seino, Yuriko, Ema, Tatsuhiko, Yonemitsu, Hiroki, Takakuwa, Manabu, Nakagawa, Shinichiro, Kono, Takuya, Asano, Masafumi, Kyoh, Suigen, Harakawa, Hideaki, Nomachi, Akiko, Ishida, Tatsuya

    المصدر: Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72741F-72741F-8, 8p

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  5. 5
    مؤتمر
    Patterning performance of hyper NA immersion lithography for 32nm node logic process.

    المؤلفون: Takahata, Kazuhiro, Kajiwara, Masanari, Kitamura, Yosuke, Ojima, Tomoko, Satake, Masaki, Fujise, Hiroharu, Seino, Yuriko, Ema, Tatsuhiko, Takakuwa, Manabu, Nakagawa, Shinichiro, Kono, Takuya, Asano, Masafumi, Kyo, Suigen, Nomachi, Akiko, Harakawa, Hideaki, Ishida, Tatsuya, Hasegawa, Shunsuke, Miyashita, Katsura, Murakami, Takashi, Nagahara, Seiji

    المصدر: Proceedings of SPIE; Nov2008, Issue 1, p714017-714017-10, 10p

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  6. 6
    مؤتمر
    Mix-and-match overlay method by compensating dynamic scan distortion error.

    المؤلفون: Kono, Takuya, Takakuwa, Manabu, Asanuma, Keita, Komine, Nobuhiro, Higashiki, Tatsuhiko

    المصدر: Proceedings of SPIE; Nov2004, Issue 1, p221-227, 7p

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