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المؤلفون: Kevin Houchens, Yaniv Abramovitz, Shay Attal, Ofer Adan, Nahum Bomshtein, Itai Buks, Ryan Hsieh, Tal Itzkovich, Jenny Perry
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0215436b7d6db8b0ca7b6d39d38e8e37
https://doi.org/10.1117/12.2669984 -
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المؤلفون: Kevin Houchens, Tal Itzkovich, Omri Baum, Noam Amit, Aner Avakrat, Shimon Levi
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII.
مصطلحات موضوعية: Optics, Materials science, Margin (machine learning), business.industry, Distortion, Extreme ultraviolet lithography, Outlier, Surface finish, Edge (geometry), business, Lithography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bf953e8414063b23319b692f9ce3d5c9
https://doi.org/10.1117/12.2514877 -
3
المؤلفون: Dhara Dave, Guido Rademaker, Anna Golotsvan, Erwin Slot, Ronny Haupt, T. Shapoval, Stefan Landis, Anat Marchelli, Stephane Rey, Tal Itzkovich, Laurent Pain, Guido De Boer, Jonathan Pradelles, Marco Jan-Jaco Wieland
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXII.
مصطلحات موضوعية: Image stitching, Offset (computer science), Optics, Materials science, Stack (abstract data type), Correlation coefficient, business.industry, Overlay, business, Massively parallel, Electron-beam lithography, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a008dc644c92908ce8182754eadae8f9
https://doi.org/10.1117/12.2297535 -
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المؤلفون: Michael E. Adel, Mark D. Smith, Sangjun Han, Dongsub Choi, Myungjun Lee, Efi Megged, Anna Golotsvan, Joonseuk Lee, Tal Itzkovich, Amnon Manassen, Yuri Paskover, Victoria Naipak, Dohwa Lee, Tom Leviant, Honggoo Lee, Zephyr Liu, Vladimir Levinski, Mi-Rim Jung, Young-Sik Kim
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Computer science, business.industry, Process (computing), 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, Process variation, Optics, 0103 physical sciences, Process window, 0210 nano-technology, business, Lithography, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::305ceb1659a85f9daa6b6d66fd9b6170
https://doi.org/10.1117/12.2258376 -
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المؤلفون: Dongsub Choi, Myungjun Lee, Zephyr Liu, Vladimir Levinski, Michael E. Adel, Tal Itzkovich, Sangjun Han, Mi-Rim Jung, Young-Sik Kim, Kangsan Lee, Mark D. Smith, Ady Levy, Dohwa Lee, Honggoo Lee, Joonseuk Lee
المصدر: SPIE Proceedings.
مصطلحات موضوعية: business.industry, Computer science, Process (computing), 02 engineering and technology, Overlay, 021001 nanoscience & nanotechnology, 01 natural sciences, law.invention, Metrology, 010309 optics, Optics, law, Dimensional metrology, 0103 physical sciences, Electronic engineering, Process window, Photolithography, 0210 nano-technology, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e44c54bc168e356e764d66526b929b5c
https://doi.org/10.1117/12.2218653 -
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المؤلفون: Dongsuk Park, Michael E. Adel, Richard McGowan, Patrick Snow, Yue Zhou, Pedro Herrera, Tal Itzkovich, Winston Cho, Janay Camp, Vidya Ramanathan, Karsten Gutjahr, Ki Cheol Ahn, Tal Marciano
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Diffraction, business.industry, Aperture, Computer science, Process (computing), 02 engineering and technology, Overlay, Grating, 021001 nanoscience & nanotechnology, Laser, 01 natural sciences, law.invention, Metrology, 010309 optics, Process variation, Optics, law, 0103 physical sciences, Wafer, 0210 nano-technology, business, Root cause analysis, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::402969714a4eaf584438848e9f182abd
https://doi.org/10.1117/12.2219668 -
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المؤلفون: Hsueh-Jen Tsai, Chia-Hung Chen, Myungjun Lee, Kuo-Yao Chou, Mark D. Smith, Jo-Lan Chin, Jen-Chou Huang, Hao-Lun Huang, Chen Dror, Healthy Huang, Jui-Chin Yang, Yuan-Ku Lan, Michael E. Adel, Harvey Cheng, Jinyan Song, Tal Itzkovich, Ady Levy, Yaniv Abramovitz, Chin-Chang Huang, I-Lin Wang, Hsien-Yen Lung
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Scanner, Depth of focus, Zernike polynomials, Exit pupil, business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Metrology, 010309 optics, symbols.namesake, Optics, 0103 physical sciences, symbols, Electronic engineering, Process window, Sensitivity (control systems), 0210 nano-technology, business, Lithography, Dram
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f7fce7d6ac86885d3ff9888443f23af9
https://doi.org/10.1117/12.2218659 -
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المؤلفون: Lipkong Yap, Karsten Gutjhar, Lokesh Subramany, Chanseob Cho, Patrick Snow, Tal Itzkovich, Vidya Ramanathan
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Back end of line, business.industry, Computer science, Process (computing), Key (cryptography), Overlay, Layer (object-oriented design), business, Computer hardware, Selection (genetic algorithm)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a8a8730974c344848e61ab337262fded
https://doi.org/10.1117/12.2086016 -
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المؤلفون: Dongsub Choi, Dohwa Lee, Sanghuck Jeon, Won-Taik Kwon, Myoung-Soo Kim, Kangsan Lee, Eitan Herzel, Mohamed Elkodadi, Tal Itzkovich, Roie Volkovich, Byongseog Lee, Sangjun Han, Honggoo Lee, Sungki Park, Mark Wagner
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Process variation, business.industry, Computer science, ComputerSystemsOrganization_COMPUTER-COMMUNICATIONNETWORKS, Computer data storage, Real-time computing, Overlay, business, Lithography, Simulation
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::af68038992b9723cafb058e0af844f94
https://doi.org/10.1117/12.2085270 -
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المؤلفون: Sean Durran, Matthias Ruhm, Eric Cotte, Rolf Seltmann, Agostino Cangiano, Tino Hertzsch, Eitan Hajaj, Daniel Fischer, Ronny Haupt, Tal Itzkovich, Carsten Hartig, Barak Bringoltz, Bernd Schulz, Boris Efraty, T. Shapoval
المصدر: SPIE Proceedings.
مصطلحات موضوعية: business.industry, Computer science, media_common.quotation_subject, Process (computing), Overlay, Asymmetry, Signal, Metrology, Stack (abstract data type), Layer (object-oriented design), Telecommunications, business, Algorithm, media_common
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::375c145b108a8434d6b039d9adb35708
https://doi.org/10.1117/12.2085788