-
1
المؤلفون: Patrick P. Naulleau, William Cork, Iacopo Mochi, Jason DePonte, Jeffrey F. Gamsby, Arnaud P. Allezy, Eric M. Gullikson, Veljko Milanovic, M.R. Dickinson, Eric Van Every, Douglas Van Camp, Markus P. Benk, W. Chao, Senajith Rekawa, Erik H. Anderson, James Macdougall, Elizabeth Martin, Kenneth A. Goldberg, Rene Delano, Daniel Zehm, Eric Acome, Vamsi Vytla, Carl Cork, M. S. Gideon Jones, Farhad Salmassi, Hanjing Huang, William B. Ghiorso
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Physics, Microscope, business.industry, Extreme ultraviolet lithography, law.invention, Numerical aperture, Optics, law, Extreme ultraviolet, Reticle, Photomask, business, Lithography, Image resolution
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::85cef16beed56b5de8e814af8350f7b6
https://doi.org/10.1117/12.2011688 -
2
المؤلفون: Levi Kennedy, Erika Gasperikova, Vamsi Vytla, Todd Jobe, Xianyang Zhu
مصطلحات موضوعية: Engineering, Discriminator, business.industry, Hand held, Metal detectors, Standard test, Key features, business, Sensitivity (electronics), Cartography, Remote sensing
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7041ba732d8ac92b357988f59b4bf732
https://doi.org/10.21236/ada569720