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1
المؤلفون: Brandon Hurt, Ryan Carlson, Yao Zhang, Xiaochun Yang, Masaki Satake, Yifu Wang, Derui Li, Vikram Tolani, Daniel Price
المصدر: International Conference on Extreme Ultraviolet Lithography 2022.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2876202d7fda11b7a731fd638bc880b1
https://doi.org/10.1117/12.2642401 -
2
المؤلفون: Frank Cm Wu, Chain Ping Chen, Le Wang, Chin Kuei Chang, Dongmei Wu, Jinhua Zeng, Vikram Tolani, Suo Li, Wei Chen
المصدر: Photomask Technology 2021.
مصطلحات موضوعية: Wafer fabrication, business.industry, Computer science, Process (computing), Reticle, Mask inspection, Wafer, business, Automation, Lithography, Aerial image, Reliability engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::93da14db4aadf23ee4f54382c72932e4
https://doi.org/10.1117/12.2600902 -
3
المؤلفون: Claire Lu, Vikram Tolani, Harper Yu, Jason Fang, Yanghui Liu, Andy Lan, Catherine Li, Zeyu Lei, Asei Chou, Wenhao Hsu
المصدر: Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.
مصطلحات موضوعية: Spectrum analyzer, Materials science, business.industry, Reticle, business, Computer hardware, Dram
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9b68b48fb0db2c86ac95feeecb3216be
https://doi.org/10.1117/12.2598020 -
4
المؤلفون: Peter Liu, Derui Li, Yao Zhang, Daniel Price, Ryan Gardner, Wallace Wang, Will Wang, Masaki Satake, George Hwa, Ryan Carlson, Vikram Tolani, Brandon Hurt
المصدر: Photomask Technology 2020.
مصطلحات موضوعية: Production line, Data collection, Computer science, Process (engineering), Semiconductor device fabrication, business.industry, Analytics, Data management, Systems engineering, Data analysis, Reticle, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::604eea499af845bedfee7b00b4674b1c
https://doi.org/10.1117/12.2573765 -
5
المؤلفون: Wonil Cho, Daniel Rost, Vikram Tolani, Daniel Price, Paul A. Morgan, Masaki Satake
المصدر: International Conference on Extreme Ultraviolet Lithography 2017.
مصطلحات موضوعية: Scanner, Computer science, business.industry, Feature (computer vision), Extreme ultraviolet lithography, Process (computing), Reticle, Computer vision, Mask inspection, Artificial intelligence, business, Grayscale, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::934273a2dc64e8e6e3de12a9a64901ff
https://doi.org/10.1117/12.2280837 -
6
المؤلفون: Chun-Jen Chen, Vikram Tolani, Chin-Ting Yang, Sandhya Gopalakrishnan, Suresh Lakkapragada, Laurent C. Tuo, Raj Bugata, George Hwa, Kaiming Chiang, Sheng-Chang Hsu
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Production line, Engineering, Semiconductor device fabrication, business.industry, Redundancy (engineering), Reticle, Mask inspection, Photomask, business, Host (network), Simulation, Failover, Computer hardware
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f6236a8d7ae006e7cc25ceda429a2e61
https://doi.org/10.1117/12.2241482 -
7
المؤلفون: Masaki Satake, Dongxue Chen, Ying Li, Lin He, Peter Hu, Linyong Pang, Vikram Tolani, Danping Peng
المصدر: aot. 1:299-321
مصطلحات موضوعية: Engineering drawing, Computer science, business.industry, Computer vision, Mask inspection, Artificial intelligence, business, Instrumentation, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::db2497aabe398304b264588be2acdf6a
https://doi.org/10.1515/aot-2012-0127 -
8
المؤلفون: Thuc Dam, Tom Cecil, Dongxue Chen, Linyong Pang, Peter Hu, Bob Gleason, Ki-Ho Baik, Danping Peng, Vikram Tolani, Lin He, Guangming Xiao
المصدر: ECS Transactions. 27:433-442
مصطلحات موضوعية: Engineering drawing, Engineering, Level set method, Computer engineering, business.industry, Computational lithography, Hardware_INTEGRATEDCIRCUITS, Key (cryptography), Inverse, Mask inspection, Node (circuits), business, Lithography
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9
المؤلفون: Bob Gleason, Tom Cecil, Ki-Ho Baik, Linyong Pang, Guangming Xiao, Thuc Dam, Peter Hu, Vikram Tolani
المصدر: ECS Transactions. 18:299-314
مصطلحات موضوعية: Engineering, Level set method, Flow (mathematics), business.industry, Process (computing), Node (circuits), Function (mathematics), business, Lithography, Algorithm, AND gate, Aerial image, Computer hardware
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10
المؤلفون: Koichi Kanno, Masaki Satake, Vikram Tolani, Hiroyuki Miyashita, Kana Ohara, Masaharu Nishiguchi, Donghwan Son
المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.
مصطلحات موضوعية: Matching (statistics), Engineering, Spectrum analyzer, Engineering drawing, business.industry, ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION, Integrated circuit layout, Image (mathematics), Software, Calibration, Computer vision, Artificial intelligence, Photomask, business, Aerial image
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::619afb90990acf774516d704fa7d7c53
https://doi.org/10.1117/12.2197609