يعرض 1 - 10 نتائج من 58 نتيجة بحث عن '"Vincent Farys"', وقت الاستعلام: 0.94s تنقيح النتائج
  1. 1
    4.6µm Low Power Indirect Time-of-Flight Pixel Achieving 88.5% Demodulation Contrast at 200MHz for 0.54MPix Depth Camera

    المؤلفون: Christopher Townsend, G. Mugny, Matteo Vignetti, Arnaud Tournier, Jeremie Teyssier, Jean-Raphael Bezal, Raoul Vergara, Pascal Fonteneau, Kevin Channon, Arnaud Authie, Thomas Bouchet, Joao Miguel Melo Santos, Francois Agut, Frederic Lalanne, Bruce Rae, Damien Miclo, Yann Desprez, Pascal Mellot, Laurent Simony, Sara Pellegrini, David Hadden, Stephane Drouard, Franck Hingant, Vincent Farys, Francois Roy, Gregory Bochet, Blandine Roig, Thibault Augey, Cedric Tubert, Celine Mas, Aurelien Mazard, Boris Rodrigues Goncalves

    المصدر: ESSCIRC

    مصطلحات موضوعية: Optics, Pixel, Channel (digital image), business.industry, EMI, Computer science, Logic gate, Capacitive sensing, Demodulation, business, Noise (electronics), Electromagnetic interference

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8d1e7cd323dfdcf719918b36e47704f9
    https://doi.org/10.1109/esscirc53450.2021.9567878

    أضف إلى المفضلة
  2. 2
    $4.6\mu \mathrm{m}$ Low Power Indirect Time-of-Flight Pixel Achieving 88.5% Demodulation Contrast at 200MHz for 0.54MPix Depth Camera

    المؤلفون: Cedric Tubert, Pascal Mellot, Yann Desprez, Celine Mas, Arnaud Authie, Laurent Simony, Gregory Bochet, Stephane Drouard, Jeremie Teyssier, Damien Miclo, Jean-Raphael Bezal, Thibault Augey, Franck Hingant, Thomas Bouchet, Blandine Roig, Aurelien Mazard, Raoul Vergara, Gabriel Mugny, Arnaud Tournier, Frederic Lalanne, Francois Roy, Boris Rodrigues Goncalves, Matteo Vignetti, Pascal Fonteneau, Vincent Farys, Francois Agut, Joao Miguel Melo Santos, David Hadden, Kevin Channon, Christopher Townsend, Bruce Rae, Sara Pellegrini

    المصدر: ESSDERC 2021 - IEEE 51st European Solid-State Device Research Conference (ESSDERC).

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::61a0f65921fbd5925d94feb4f797b7d5
    https://doi.org/10.1109/essderc53440.2021.9631791

    أضف إلى المفضلة
  3. 3
    Beyond contrast curve approach: a grayscale model applied to sub-5µm patterns

    المؤلفون: Marion Paris, Nacima Allouti, Sébastien Bérard-Bergery, Patrick Quéméré, Vincent Farys, Pierre Chevalier, Jérôme Vaillant, Charlotte Beylier

    المصدر: Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.

    مصطلحات موضوعية: Microlens, Pixel, Computer science, business.industry, Mask data preparation, Grayscale, Photodiode, law.invention, Optics, Resist, law, Photomask, business, Lithography

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e54470d25c7169b78a44d515ca1db0a2
    https://doi.org/10.1117/12.2514234

    أضف إلى المفضلة
  4. 4
    Framework for SEM contour analysis

    المؤلفون: C. Fenouillet-Beranger, E. Serret, L. Schneider, Vincent Farys

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Structure (mathematical logic), business.industry, Computer science, Noise reduction, 020206 networking & telecommunications, Pattern recognition, 02 engineering and technology, Metrology, Simple (abstract algebra), 0202 electrical engineering, electronic engineering, information engineering, 020201 artificial intelligence & image processing, Topological skeleton, Computer vision, Noise (video), Artificial intelligence, business

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6a8d3fe922cbe7acadb7c8840ce08608
    https://doi.org/10.1117/12.2258059

    أضف إلى المفضلة
  5. 5
    Si-photonics waveguides manufacturability using advanced RET solutions

    المؤلفون: G. Kerrien, Emek Yesilada, Sebastien Cremer, Vincent Farys, B. Orlando, N. Zeggaoui, Vlad Liubich, Alexander Tritchkov

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Photon, Silicon, Computer science, chemistry.chemical_element, Hardware_PERFORMANCEANDRELIABILITY, 02 engineering and technology, 01 natural sciences, Waveguide (optics), law.invention, 010309 optics, Optics, Optical proximity correction, law, 0103 physical sciences, Hardware_INTEGRATEDCIRCUITS, Electronic engineering, Wafer, Process window, Lithography, business.industry, Photonic integrated circuit, Skew, 021001 nanoscience & nanotechnology, Design for manufacturability, chemistry, Photonics, Photolithography, 0210 nano-technology, business, Waveguide

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::09bebc3f6444aaf6a8777a6f6d7d4d34
    https://doi.org/10.1117/12.2257906

    أضف إلى المفضلة
  6. 6
    Advanced metrology by offline SEM data processing

    المؤلفون: L. Schneider, Vincent Farys, B. Le-Gratiet, M. Besacier, J. Ducote, Amine Lakcher

    المساهمون: Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES)

    المصدر: Proceedings of SPIE, the International Society for Optical Engineering
    Proceedings of SPIE, the International Society for Optical Engineering, SPIE, The International Society for Optical Engineering, 2017, pp.10446, art. no. 104460L. ⟨10.1117/12.2280096⟩
    Proceedings of SPIE, the International Society for Optical Engineering, 2017, pp.10446, art. no. 104460L. ⟨10.1117/12.2280096⟩

    مصطلحات موضوعية: Data processing, Manufacturing process, business.industry, Computer science, 02 engineering and technology, 021001 nanoscience & nanotechnology, Chip, computer.software_genre, 01 natural sciences, Metrology, 010309 optics, 0103 physical sciences, Computer vision, Artificial intelligence, Data mining, Process variability, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, 0210 nano-technology, business, Lithography, computer, Monitoring features, ComputingMilieux_MISCELLANEOUS

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::05884769678390041beded55b076fac8
    https://hal.univ-grenoble-alpes.fr/hal-02344512

    أضف إلى المفضلة
  7. 7
    Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

    المؤلفون: Ana-Maria Armeanu, Isabelle Schanen, Frederic Huguennet, Michael Chomat, Ingo Bork, Peter Buck, Nacer Zine El Abidine, Frank Sundermann, Vincent Farys, Emek Yesilada

    المساهمون: Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC ), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), STMicroelectronics [Crolles] (ST-CROLLES), Laboratoire des technologies de la microélectronique (LTM ), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Garet, Frédéric

    المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS
    Journal of Micro/Nanolithography, MEMS, and MOEMS, 2016, 15 (2), pp.021011
    Journal of Micro/Nanolithography, MEMS, and MOEMS, Society of Photo-optical Instrumentation Engineers, 2016, 15 (2), pp.021011

    مصطلحات موضوعية: Computer science, [SPI] Engineering Sciences [physics], 02 engineering and technology, 01 natural sciences, Data modeling, 010309 optics, [SPI]Engineering Sciences [physics], Optics, Optical proximity correction, 0103 physical sciences, Electrical and Electronic Engineering, ComputingMilieux_MISCELLANEOUS, business.industry, Mechanical Engineering, Rounding, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 3D modeling, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Resist, Logic gate, Photomask, 0210 nano-technology, business, Focus (optics)

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::018cf9ff84893eaec87fa0d733cc8a68
    https://hal.science/hal-02025168

    أضف إلى المفضلة
  8. 8
    New placement estimator for contact hole printed with DSA

    المؤلفون: L. Schneider, Vincent Farys, E. Serret, C. Fenouillet-Beranger

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Polymethyl methacrylate, Computer science, business.industry, Phase (waves), Estimator, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Reduction (complexity), Optics, Optical proximity correction, Copolymer, Layer (object-oriented design), 0210 nano-technology, business, Lithography, Algorithm

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b6c2f12e03bd43eb52ee04b0499022dd
    https://doi.org/10.1117/12.2219015

    أضف إلى المفضلة
  9. 9
    Enablement of DSA for VIA layer with a metal SIT process flow

    المؤلفون: C. Fenouillet-Beranger, L. Schneider, E. Serret, Vincent Farys

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Standard cell, Computer science, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, Topology, 01 natural sciences, Electrical connection, law.invention, 010309 optics, law, 0103 physical sciences, Line (geometry), Hardware_INTEGRATEDCIRCUITS, Multiple patterning, Node (circuits), Photolithography, Layer (object-oriented design), 0210 nano-technology, Block (data storage)

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cde0ecc7dd085e61c0f984908a83e2b7
    https://doi.org/10.1117/12.2218808

    أضف إلى المفضلة
  10. 10
    Estimate design sensitivity to process variation for the 14nm node

    المؤلفون: Guillaume Landie, Vincent Farys

    المصدر: SPIE Proceedings.

    مصطلحات موضوعية: Process variation, Computer engineering, Resist, Computer science, Robustness (computer science), Reticle, Process window, Lithography, Simulation, Design for manufacturability

    URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::52d899be48f70a6f64d22bbc115757d5
    https://doi.org/10.1117/12.2219067

    أضف إلى المفضلة
أدوات البحث: أحصل على تغذية RSS – أرسل هذا البحث بالبريد الإلكتروني – حفظ البحث – جدول التنبيهات: لا شيء