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المؤلفون: Vibhu Jindal, David N. Ruzic, W. M. Lytle, Daniel Andruczyk
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Carbon film, Silicon, chemistry, Plasma cleaning, Hydrogen, Etching (microfabrication), Sputtering, Extreme ultraviolet lithography, Analytical chemistry, Particle, chemistry.chemical_element, Nanotechnology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5d374d686484cf83ec6f2fafc99d1d91
https://doi.org/10.1117/12.881038 -
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المؤلفون: David N. Ruzic, M. J. Neumann, W. M. Lytle, R. E. Lofgren, V. Surla
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Plasma cleaning, Silicon, Extreme ultraviolet lithography, chemistry.chemical_element, Nanotechnology, Sputter deposition, law.invention, chemistry, Sputtering, law, Wafer, Photolithography, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fc3786ee346d64fbabbb212ef183116e
https://doi.org/10.1117/12.846282 -
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المؤلفون: C. E. Das, David N. Ruzic, D. S. Szybilski, W. M. Lytle, R. Raju
المصدر: Alternative Lithographic Technologies.
مصطلحات موضوعية: Materials science, Silicon, Extreme ultraviolet lithography, Analytical chemistry, Nanoparticle, chemistry.chemical_element, Nanotechnology, Plasma, law.invention, chemistry, law, Metastability, Ionization, Photolithography, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e114b5cd151c6256b70850c226695702
https://doi.org/10.1117/12.813184 -
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المؤلفون: David N. Ruzic, H. Shin, M. J. Neumann, J. Sporre, W. M. Lytle, R. Raju
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Contamination control, Materials science, business.industry, Extreme ultraviolet lithography, law.invention, Optics, Resist, law, Extreme ultraviolet, Reactive-ion etching, Stepper, Photolithography, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4afa52321e5e3d446c37bfd8786ae528
https://doi.org/10.1117/12.804689 -
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المؤلفون: V. Surla, W. M. Lytle, M. J. Neumann, R. Raju, David N. Ruzic, D. S. Szybilski, C. E. Das
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Chemistry, business.industry, Extreme ultraviolet lithography, Wet cleaning, chemistry.chemical_element, Nanotechnology, law.invention, law, Extreme ultraviolet, Optoelectronics, Particle, Wafer, Photomask, Photolithography, business, Helium
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::68262ef325bf891e93dfc7b5c20e91c6
https://doi.org/10.1117/12.804704 -
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المؤلفون: C. E. Das, David N. Ruzic, W. M. Lytle, R. Raju, M. J. Neumann, H. Shin
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Fabrication, Silicon, Plasma cleaning, business.industry, Extreme ultraviolet lithography, chemistry.chemical_element, Nanoparticle, law.invention, Optics, chemistry, law, Extreme ultraviolet, Particle, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bac9071b27888bb8ba7595ad3c28b8d0
https://doi.org/10.1117/12.772363 -
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المؤلفون: W. M. Lytle, H. Shin, David N. Ruzic
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Debye sheath, Materials science, Plasma cleaning, business.industry, Extreme ultraviolet lithography, Nanotechnology, law.invention, symbols.namesake, law, Etching (microfabrication), symbols, Optoelectronics, Particle, Wafer, Particle size, Photolithography, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::509bf5c5932e1a33b2ab11643fa91d3d
https://doi.org/10.1117/12.712307 -
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