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المؤلفون: Yuanfang Lu, Wenyin Lu, Taifong Chao, Haigou Huang, Qiang Fang, Stan D. Tsai, Hong Jin Kim, John H. Zhang, Dinesh Koli
المصدر: 2018 China Semiconductor Technology International Conference (CSTIC).
مصطلحات موضوعية: CMOS, business.industry, Computer science, High selectivity, Slurry, Process improvement, Step height, Process control, Wafer, Process engineering, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d0f9ae687a094bfb21dd5a3c87f46a51
https://doi.org/10.1109/cstic.2018.8369258