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المؤلفون: Patrick P. Naulleau, Daniel Zehm, Lauren McQuade, Wenhua Zhu, Christopher L. Anderson, Jason DePonte, Seno Rekawa, Eric M. Gullikson, M.R. Dickinson, Weilun Chao, Farhad Salmassi, Jeff Gamsby, Ryan Miyakawa, Will Cork, Rene Delano, Lucas Conley, Carl Cork, Brandon Vollmer, Geoff Gaines, Arnaud P. Allezy, Gideon Jones
المصدر: Extreme Ultraviolet (EUV) Lithography XI.
مصطلحات موضوعية: Scanner, Materials science, business.industry, Extreme ultraviolet lithography, Photoresist, Vibration, symbols.namesake, Fourier transform, Vibration isolation, Optics, Resist, symbols, business, MOX fuel
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6fcdd18ed1291baa8f99cac8ae4dcc2d
https://doi.org/10.1117/12.2552125 -
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المؤلفون: Jason DePonte, Christopher N. Anderson, Will Cork, Rene Delano, Jeff Gamsby, Eric M. Gullikson, Senajith Rekawa, Weilun Chao, Patrick P. Naulleau, Farhad Salmassi, Ryan Miyakawa, Brandon Vollmer, Geoff Gaines, Carl Cork, Stephen Meyers, Wenhua Zhu, Gideon Jones, M.R. Dickinson, Arnaud P. Allezy, Daniel Zehm
المساهمون: Goldberg, Kenneth A
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Field of view, Synchrotron, law.invention, Optics, Beamline, law, Extreme ultraviolet, Wafer, business, Lithography, Aerial image
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0b94d6e57f0b524b507cc028fe56d679
https://escholarship.org/uc/item/4m8939b8