-
1
المؤلفون: Eric C. Hansen, Yichi Zhang, Ji Yeon Kim, William D. Hinsberg
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 21
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9c8d0c95203cce03c75bccff1f787edf
https://doi.org/10.1117/1.jmm.21.4.041405 -
2
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 20
مصطلحات موضوعية: Resist, Stochastic process, Extreme ultraviolet lithography, Monte Carlo method, Electronic engineering, Statistical fluctuations, Photoresist, Lithography, Photon counting
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0f73f5e03fb8e2ddae6ce08ae118bc8b
https://doi.org/10.1117/1.jmm.20.1.014603 -
3
المصدر: International Conference on Extreme Ultraviolet Lithography 2019.
مصطلحات موضوعية: Resist, Photon statistics, Extreme ultraviolet lithography, Component (UML), Monte Carlo method, Process changes, Lithography, Reliability engineering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ad2d986218b07303cb1f4d795ef1cd0b
https://doi.org/10.1117/12.2537632 -
4
المؤلفون: Bo Xu, Oleg Kostko, Paul D. Ashby, Kristina D. Closser, Yi Liu, David Prendergast, Gregory M. Wallraff, William D. Hinsberg, Patrick P. Naulleau, Deirdre L. Olynick, D. Frank Ogletree, Daniel Slaughter, Musahid Ahmed
المصدر: The Journal of chemical physics, vol 149, iss 15
Kostko, O; Xu, B; Ahmed, M; Slaughter, DS; Ogletree, DF; Closser, KD; et al.(2018). Fundamental understanding of chemical processes in extreme ultraviolet resist materials. The Journal of chemical physics, 149(15), 154305. doi: 10.1063/1.5046521. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/50h4g627مصطلحات موضوعية: Chemical Physics, Auger effect, Extreme ultraviolet lithography, Absorption cross section, General Physics and Astronomy, 02 engineering and technology, Electron, Photoionization, 021001 nanoscience & nanotechnology, 01 natural sciences, Molecular physics, symbols.namesake, Engineering, Resist, Extreme ultraviolet, Ionization, 0103 physical sciences, Physical Sciences, Chemical Sciences, symbols, Physical and Theoretical Chemistry, 010306 general physics, 0210 nano-technology
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0fdd58fc45c42e90990ab6ff04573ab5
https://escholarship.org/uc/item/50h4g627 -
5
المصدر: Wiegel, AA; Wilson, KR; Hinsberg, WD; & Houle, FA. (2015). Stochastic methods for aerosol chemistry: A compact molecular description of functionalization and fragmentation in the heterogeneous oxidation of squalane aerosol by OH radicals. Physical Chemistry Chemical Physics, 17(6), 4398-4411. doi: 10.1039/c4cp04927f. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/120800qc
Physical chemistry chemical physics : PCCP, vol 17, iss 6مصطلحات موضوعية: Chemical Physics, Hydrogen, Radical, Kinetics, Kinetic scheme, General Physics and Astronomy, chemistry.chemical_element, Photochemistry, Redox, Aerosol, chemistry.chemical_compound, Engineering, chemistry, Squalane, Physical Sciences, Chemical Sciences, Alkoxy group, Physical and Theoretical Chemistry
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::237e47c22a98fefd5902db43e0b95265
https://doi.org/10.1039/c4cp04927f -
6
المصدر: Wiegel, AA; Liu, MJ; Hinsberg, WD; Wilson, KR; & Houle, FA. (2017). Diffusive confinement of free radical intermediates in the OH radical oxidation of semisolid aerosols. Physical Chemistry Chemical Physics, 19(9), 6814-6830. doi: 10.1039/c7cp00696a. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/6k79g3t2
Physical chemistry chemical physics : PCCP, vol 19, iss 9مصطلحات موضوعية: Chemical Physics, 010504 meteorology & atmospheric sciences, Radical, Inorganic chemistry, Condensation, Evaporation, General Physics and Astronomy, 010402 general chemistry, 01 natural sciences, Chemical reaction, Redox, 0104 chemical sciences, Climate Action, chemistry.chemical_compound, Engineering, chemistry, Chemical physics, Squalane, Physical Sciences, Chemical Sciences, Particle, Reactivity (chemistry), Physical and Theoretical Chemistry, 0105 earth and related environmental sciences
وصف الملف: application/pdf
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d6c6a609bab2117e576e4d3659bd65e6
https://pubmed.ncbi.nlm.nih.gov/28218326 -
7
المؤلفون: William D. Hinsberg, Steven J. Holmes, Alexander Friz, Hoa D. Truong, Daniel P. Sanders, Joy Cheng, Stefan Harrer, Matthew E. Colburn
المصدر: ACS Nano. 4:4815-4823
مصطلحات موضوعية: Directed self assembly, Materials science, Water immersion, law, General Engineering, General Physics and Astronomy, General Materials Science, Nanotechnology, Photoresist, Photolithography, Lithography, Polarity (mutual inductance), law.invention
-
8
المؤلفون: Hoa Trung, Steven Harrer, Charles T. Rettner, Matthew E. Colburn, Steven J. Holmes, Ho-Cheol Kim, Daniel P. Sanders, Joy Cheng, William D. Hinsberg, Alexander Fritz
المصدر: Journal of Photopolymer Science and Technology. 23:11-18
مصطلحات موضوعية: Materials science, Fabrication, Polymers and Plastics, business.industry, Organic Chemistry, Nanotechnology, Characterization (materials science), law.invention, law, Materials Chemistry, Multiple patterning, Optoelectronics, Wafer, Photolithography, business, Lithography, Next-generation lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::01928b1b7435815e263268f415ac1d5d
https://doi.org/10.2494/photopolymer.23.11 -
9
المؤلفون: Young-Hye Na, Alshakim Nelson, Alexander Sutherland, Charles T. Rettner, Ho-Cheol Kim, Jed W. Pitera, Joy Cheng, William D. Hinsberg, Daniel P. Sanders
المصدر: Journal of Photopolymer Science and Technology. 22:219-222
مصطلحات موضوعية: Directed self assembly, Materials science, Polymers and Plastics, Self-healing, Organic Chemistry, Scalability, Materials Chemistry, Nanotechnology, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f0e1530c5733a8bafce221a8a8444495
https://doi.org/10.2494/photopolymer.22.219 -
10
المؤلفون: William D. Hinsberg, Ho-Cheol Kim
المصدر: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:1369-1382
مصطلحات موضوعية: Length scale, Materials science, business.industry, Nanotechnology, Surfaces and Interfaces, Integrated circuit, Condensed Matter Physics, Surfaces, Coatings and Films, law.invention, law, Polymer chemistry, Copolymer, Microelectronics, Self-assembly, Photolithography, Thin film, business, Lithography
Find this issue from the American Chemical Society 
Find this article in full text from Scitation.