المؤلفون: Qiang, Ming^{Aff1, IDs11664024112244_cor1}, Wang, Mengjie, Chen, Siyuan, Yin, Xiaomeng, Wu, Lunzhe, Fan, Youyu, Xu, Xueke, Wang, Zhe^{Aff1, IDs11664024112244_cor8}, Dun, Aihuan^{Aff1, IDs11664024112244_cor9}

المصدر: Journal of Electronic Materials. :1-11

المؤلفون: Chen, Jun, Wu, Lunzhe, Wang, Lin^{Aff1, IDs1109002410456w_cor3}, Hu, Chen, Wei, Chaoyang, Shao, Jianda

المصدر: Plasma Chemistry and Plasma Processing. 44(2):927-943

المؤلفون: Qiang, Ming, Wang, Mengjie, Xu, Xueke, Wu, Lunzhe, Wang, Zhe, Dun, Aihuan

المصدر: In Infrared Physics and Technology June 2024 139

المؤلفون: Wu, Lunzhe, Zhao, Liangxiao, Wang, Zhe, Walker, David, Yu, Guoyu, Li, Hongyu, Bu, Yang

المصدر: In Optics and Lasers in Engineering October 2024 181

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المؤلفون: Yu, Guoyu^Aff1, Wu, Lunzhe, Su, Xing, Li, Yuancheng, Wang, Ke, Li, Hongyu^{Aff1, Aff5}, Walker, David^{Aff1, Aff6, Aff7}

المصدر: Journal of the European Optical Society-Rapid Publications. 15(1)

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المؤلفون: Wang Zhe, Zhu Xiaolei, Dun Aihuan, Wu Lingqi, Wu Lunzhe, Bing Peng, Xu Xueke, Chen Hu

المصدر: Optical Design and Testing X.

مصطلحات موضوعية: Continuous phase modulation, Materials science, business.industry, Polishing, Atmospheric-pressure plasma, Laser, Residual, Power (physics), law.invention, Dwell time, Optics, Machining, law, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0ad709a415622e82b6f413f731643ce0
https://doi.org/10.1117/12.2573825

المؤلفون: 吴伦哲 Wu Lunzhe, 徐学科 Xu Xueke, 吴令奇 Wu Lingqi, 王哲 Wang Zhe

المصدر: Infrared and Laser Engineering. 51:20220602

مصطلحات موضوعية: Space and Planetary Science, Aerospace Engineering, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0a5643ca842f865d45cc513eb5c41bbc
https://doi.org/10.3788/irla20220602

المؤلفون: Xu Xueke, Aihuan Dun, Song Li, Wu Lunzhe, Wang Zhe

المصدر: Second Target Recognition and Artificial Intelligence Summit Forum.

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Plasma etching, Machining, chemistry, X-ray photoelectron spectroscopy, Machinability, Silicon carbide, Polishing, Atmospheric-pressure plasma, Process variable, Composite material

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5bd25d7b5cb6959c17b62b21f61ea312
https://doi.org/10.1117/12.2552352