يعرض 1 - 10 نتائج من 27 نتيجة بحث عن '"Wu, Yongyu"', وقت الاستعلام: 0.78s تنقيح النتائج
  1. 1
    مؤتمر
    End-to-End Lithography Modeling Based on Process Parameters and Deep Learning

    المؤلفون: Lin, Zebang, Ren, Kun, Gao, Dawei, Wu, Yongyu, Xu, Shibin, Lu, Miaomiao

    المصدر: 2024 2nd International Symposium of Electronics Design Automation (ISEDA) Electronics Design Automation (ISEDA), 2024 2nd International Symposium of. :524-529 May, 2024

    Relation: 2024 2nd International Symposium of Electronics Design Automation (ISEDA)

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  2. 2
    مؤتمر
    Impact of Lightly Doped Drain on Hot Carrier Degradation Variability in N-FETs and SRAM Cells

    المؤلفون: Teng, Qiao, Wu, Yongyu, Kang, Junzhe, Xu, Kai, Gao, Dawei

    المصدر: 2024 IEEE International Reliability Physics Symposium (IRPS) International Reliability Physics Symposium (IRPS), 2024 IEEE. :1-4 Apr, 2024

    Relation: 2024 IEEE International Reliability Physics Symposium (IRPS)

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  3. 3
    مؤتمر
    Exploring the Effect of Gate Oxide Process on Electrical Performance of CMOS Device

    المؤلفون: Hu, Yongkang, Teng, Qiao, Wu, Yongyu, Wang, Zenan, Xu, Kai

    المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-4 Mar, 2024

    Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)

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  4. 4
    مؤتمر
    The Modeling and Optimization of Line Width Roughness in Polysilicon Gate for Improving the Performance of CMOS Device

    المؤلفون: Wang, Yaoting, Kong, Mengshu, Wu, Yongyu, Gao, Dawei, Xu, Kai

    المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-3 Mar, 2024

    Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)

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  5. 5
    مؤتمر
    Effect of Lightly Doped Drain Process on Variability for Static Random-Access Memory

    المؤلفون: Teng, Qiao, Hu, Yongkang, Wu, Yongyu, Wang, Hai, Wang, Zenan, Gao, Dawei

    المصدر: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC) Science and Technology for Integrated Circuits (CSTIC), 2024 Conference of. :1-3 Mar, 2024

    Relation: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC)

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  6. 6
    مؤتمر
    Photolithography Hotspot Detection Based on Deep Learning LHD Model

    المؤلفون: Jiang, Xiaolong, Ren, Kun, Lin, Zebang, Gao, Dawei, Wu, Yongyu, Jin, Yadong, Du, Chunshan, Tian, Zhengguo, Zou, Sihang, Sun, Chenwei, Hu, Xinyi, Wan, Qijian

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-5 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  7. 7
    مؤتمر
    An Approach to Extracting SRAF Rules from Inverse Lithography Technology Results

    المؤلفون: Jin, Yao, Li, Xuan, Lin, Zebang, Ren, Kun, Gao, Dawei, Wu, Yongyu, Zhao, Xuan, Tian, Zhengguo, Chen, Xutao, Zou, Sihang, Sun, Chenwei

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-4 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  8. 8
    مؤتمر
    Application of Genetic Algorithm to Solving Better SRAF Rules

    المؤلفون: Li, Xuan, Ren, Kun, Gao, Dawei, Wu, Yongyu, Pang, Bo, Zou, Sihang, Tian, Zhenguo

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-4 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  9. 9
    مؤتمر
    Test Pattern Sampling Methodology for Model Tuning Efficiency and Robustness Improvement

    المؤلفون: Yang, Lingxue, Ren, Kun, Gao, DaWei, Wu, Yongyu, Zhou, Xinjiang, Sun, Chenwei, Tian, Zhengguo

    المصدر: 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-4 Oct, 2023

    Relation: 2023 International Workshop on Advanced Patterning Solutions (IWAPS)

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  10. 10
    مؤتمر
    Contour Extraction Assists in Distinguishing Lithographic Hotspot

    المؤلفون: Meng, Liuye, Ren, Kun, Gao, Dawei, Wu, Yongyu

    المصدر: 2024 2nd International Symposium of Electronics Design Automation (ISEDA) Electronics Design Automation (ISEDA), 2024 2nd International Symposium of. :758-759 May, 2024

    Relation: 2024 2nd International Symposium of Electronics Design Automation (ISEDA)

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