المؤلفون: Fang-Hao Hsu, Kuo-Feng Lo, Xin-Guan Lin, Han-Hui Hsu, Yuan-Chieh Chiu, Hong-Ji Lee, Nan-Tzu Lian, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu

المصدر: 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) Advanced Semiconductor Manufacturing Conference (ASMC), 2014 25th Annual SEMI. :242-244 May, 2014

Relation: 2014 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)

المؤلفون: Kuo-Feng Lo, Kuang-Chao Chen, Nan-Tzu Lian, Tahone Yang, Xin-Guan Lin, Fang-Hao Hsu, Hong-Ji Lee

المصدر: 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Etch pit density, chemistry, Etching (microfabrication), Oxide, Wafer, Saturation (chemistry), Silicon oxide, Salicide, Topology, Buffered oxide etch

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0ac92520014de6d88d07fcbaa352b4ea
https://doi.org/10.1109/asmc.2015.7164501

المؤلفون: Shih-Chin Lee, Hong-Ji Lee, Hsu-Sheng Yu, Chih-Kai Yang, Shao-En Chang, Nan-Tzu Lian, Tahone Yang, Kuo-Feng Lo, Kuang-Chao Chen, Xin-Guan Lin

المصدر: 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

مصطلحات موضوعية: Electric arc, Yield (engineering), Materials science, chemistry, Passivation, Etching (microfabrication), Forensic engineering, chemistry.chemical_element, Wafer, Dielectric, Tungsten, Composite material, Bevel

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::395a67de9902086c523b90be2b026bb0
https://doi.org/10.1109/asmc.2015.7164452

المؤلفون: Han-Hui Hsu, Hong-Ji Lee, Chih-Yuan Lu, Kuo-Feng Lo, Yuan-Chieh Chiu, Fang-Hao Hsu, Kuang-Chao Chen, Xin-Guan Lin, Nan-Tzu Lian, Tahone Yang

المصدر: 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014).

مصطلحات موضوعية: Plasma etching, Etching (microfabrication), business.industry, RF power amplifier, Flow (psychology), Electronic engineering, Optoelectronics, Capacitively coupled plasma, Dielectric, Reactive-ion etching, Silicon oxide, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9201bc3542d87239a2da7d6c15d192ed
https://doi.org/10.1109/asmc.2014.6847006