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1
المؤلفون: Kevin Houchens, Yaniv Abramovitz, Shay Attal, Ofer Adan, Nahum Bomshtein, Itai Buks, Ryan Hsieh, Tal Itzkovich, Jenny Perry
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0215436b7d6db8b0ca7b6d39d38e8e37
https://doi.org/10.1117/12.2669984 -
2
المؤلفون: Sangho Jo, Jongsu Kim, Youngsik Park, Muyoung Lee, Jinhong Park, Chang-Min Park, Jeong Ho Yeo, Yaniv Abramovitz, You Jin Kim, Asaf Shoham, Shmuel Ben Nissim
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::c4409243d9279b6f6f9a1e5a52adb9bc
https://doi.org/10.1117/12.2657672 -
3
المؤلفون: Alain Moussa, Janusz Bogdanowicz, Benjamin Groven, Pierre Morin, Matteo Beggiato, Mohamed Saib, Gaetano Santoro, Yaniv Abramovitz, Kevin Houtchens, Shmuel Ben Nissim, Noga Meir, Joey Hung, Adam M. Urbanowicz, Roy Koret, Igor Turovets, Gian Francesco Lorusso, Anne-Laure Charley
المصدر: Metrology, Inspection, and Process Control XXXVII.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e2d4816ee1ae6392a25060d9b03288ac
https://doi.org/10.1117/12.2657968 -
4
المؤلفون: Yu Zhang, David Wei Zhang, Yuyang Bian, Biqiu Liu, Cong Zhang, Jun Huang, Jiawang Song, Yang Gao, Qiang Zhou, Wei Chen, Siqun Xiao, Shmuel Ben Nissim, Kevin Houchens, Omri Baum, Amit Zakay, Tal Ayzik, Yaniv Abramovitz
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology. 21
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::132931604fa8372bd4ac7cc9d438b449
https://doi.org/10.1117/1.jmm.21.4.041605 -
5
المؤلفون: Yuyang Bian, Biqiu Liu, Xijun Guan, Xiaobo Guo, Cong Zhang, Wenzhan Zhou, Jun Huang, Yu Zhang, Jiawang Song, Yang Gao, Shmuel Nissim, Kevin Houchens, Omri Baum, Qiang Zhou, Zaisan Yang, Amit Zakay, Tal Ayzik, Yaniv Abramovitz
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a5cda6b86bb61fe7eb7eee181d776b72
https://doi.org/10.1117/12.2614221 -
6
المؤلفون: Yaniv Abramovitz, Jeong-Ho Yeo, Taekwon Jee, Honggoo Lee, Sangho Lee, Chanha Park
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7ad42fa189535291ad28f6d54e31f1b6
https://doi.org/10.1117/12.2613931 -
7
المؤلفون: Gaetano Santoro, Kevin Houchens, Janusz Bogdanowicz, Moshe Elizov, Lior Yaron, Michael Chemama, Alex Goldenshtein, Amit Zakay, Noam Amit, Basoene Briggs, Antoine Pacco, Romain Delhougne, Andrew Cockburn, Yaniv Abramovitz, Aviram Tam, Ofer Adan, Hans Mertens, Anne-Laure Charley, Naoto Horiguchi, Philippe Leray, Gian F. Lorusso
المصدر: Metrology, Inspection, and Process Control XXXVI.
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::195e93429c6fd40ba22635775d2aeaee
https://doi.org/10.1117/12.2613771 -
8
المؤلفون: Yu Zhang, Yuyang Bian, Yaniv Abramovitz, Yifei Zhu, Omri Baum, Alexander Vipolzov, Qiang Zhou, Biqiu Liu, Song Gao, Shmuel Ben Nissim, Cong Zhang, Uri Smolyan, Jun Huang, Xiaobo Guo
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Accuracy and precision, Sampling (signal processing), Computer science, Line (geometry), Electronic engineering, Process (computing), Node (circuits), Overlay, Critical dimension, Die (integrated circuit)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d7038abbb89ac80e8855e45f742b2d35
https://doi.org/10.1117/12.2585391 -
9
المؤلفون: Yeo Jeongho, Yaniv Abramovitz, Insung Kim, Noam Shaham, Kevin Houchens, Jong-Su Kim, Byoung-Hoon Kim, PavanKumar Mannava, Sangho Jo, Boo-Hyun Ham
المصدر: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
مصطلحات موضوعية: Data set, Computer science, Margin (machine learning), Data integrity, Extreme ultraviolet lithography, Real-time computing, Process (computing), Node (circuits), Overlay, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5a0c0da5729b507cb22abc80608cc5ae
https://doi.org/10.1117/12.2585369 -
10
المؤلفون: Philippe Leray, Ofer Adan, Laurens Kwakman, Guy Levin, Jason Arjavac, Sandip Halder, Shimon Levi, Michael Strauss, Lior Lior Sarig, Yaniv Abramovitz, Ashley Tilson
المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIV.
مصطلحات موضوعية: business.industry, Computer science, Node (networking), Line (geometry), Wafer, Overlay, business, Lithography, Computer hardware, Metrology
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::73f3f0d3aae03390db4b464ba2569bd5
https://doi.org/10.1117/12.2563606