المؤلفون: Chen, C., Chang, C.Y., Chou, J.W., Huang, C.T., Lin, K.C., Yao-Chin Cheng, Chih-Yung Lin

المصدر: Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503) Electron devices meeting - Hong Kong Electron Devices Meeting, 2000. Proceedings. 2000 IEEE Hong Kong. :44-47 2000

Relation: Proceedings 2000 IEEE Hong Kong Electron Devices Meeting

المؤلفون: Hui-Hsin Hsu, Nathan, Jian-Wen You, Huan-Chi Ma, Shih-Ching Lee, Chen, Eliot, Huang, L. S., Yao-Chin Cheng, Cheng, Osbert, Chen, I. C.

المصدر: 2012 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2012 IEEE International. :XT.13.1-XT.13.4 Apr, 2012

Relation: 2012 IEEE International Reliability Physics Symposium (IRPS)

المؤلفون: Zhi-Cheng Lee, Lee Kai-Lin, Li-Feng Chin, Osbert Cheng, Yao-Chin Cheng

المصدر: IEEE Transactions on Electron Devices. 67:2232-2237

مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Doping, 01 natural sciences, Electronic, Optical and Magnetic Materials, Logic gate, 0103 physical sciences, MOSFET, Saturation (graph theory), Optoelectronics, Production (computer science), Electrical and Electronic Engineering, Metal gate, business, High-κ dielectric, Hot-carrier injection

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::4bd1e891b109347f6817cee9521a4408
https://doi.org/10.1109/ted.2020.2989728

المؤلفون: Ta Kang Lo, Jakent Pai, Jia Bin Yeh, Kai Lin Lee, Sheng Cho, Wei Jun Chen, Achilles Fang, Osbert Cheng, Steven Hsu, S. W. Hsieh, You Ren Liu, Vincent Hsueh, Daniel Chen, Zhi Cheng Lee, Widson Wu, Jen Wei Pan, G. C. Hung, Leonard Chen, Yao Chin Cheng

المصدر: 2021 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).

مصطلحات موضوعية: Reduction (complexity), Passivation, Computer science, Interface (computing), Process (computing), Electronic engineering, Flicker noise, Process optimization, Degradation (telecommunications), Communication channel

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::728dc3f57ecffc788c2ba1a16dc072bd
https://doi.org/10.1109/vlsi-tsa51926.2021.9440094

المؤلفون: San-Lein Wu, Cheng-Wen Kuo, Yao-Tsung Huang, Shoou-Jinn Chang, Yao-Chin Cheng, Osbert Cheng, Ya-Ting Chen

المصدر: IEEE Transactions on Nanotechnology. 10:1053-1058

مصطلحات موضوعية: Materials science, Silicon, business.industry, chemistry.chemical_element, Substrate (electronics), Computer Science Applications, Stress (mechanics), CMOS, chemistry, Electronic engineering, Optoelectronics, Degradation (geology), Electrical and Electronic Engineering, Power MOSFET, business, Cmos process, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::966f04e3991762173e03f3e450a29cdc
https://doi.org/10.1109/tnano.2010.2103567

المؤلفون: Shoou-Jinn Chang, Yao Tsung Huang, Yao Chin Cheng, San Lein Wu, Osbert Cheng, Cheng Wen Kuo, Ching Yao Chang, Po Chin Huang

المصدر: IEEE Electron Device Letters. 32:835-837

مصطلحات موضوعية: Imagination, Materials science, Phonon scattering, business.industry, media_common.quotation_subject, Electrical engineering, Electronic, Optical and Magnetic Materials, Stress (mechanics), chemistry.chemical_compound, Tunnel effect, Silicon nitride, chemistry, Logic gate, MOSFET, Optoelectronics, Electrical and Electronic Engineering, business, Quantum tunnelling, media_common

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::9587e7a7ecd0dbecef64d6facd4c1611
https://doi.org/10.1109/led.2011.2140350

المؤلفون: Yao-Chin Cheng, Ya Ting Chen, Cheng Wen Kuo, Yao-Tsung Huang, Shoou-Jinn Chang, San Lein Wu, Osbert Cheng

المصدر: IEEE Electron Device Letters. 31:500-502

مصطلحات موضوعية: Materials science, business.industry, Infrasound, Transconductance, Semiconductor device modeling, Low frequency, Noise (electronics), Electronic, Optical and Magnetic Materials, Stress (mechanics), CMOS, MOSFET, Electronic engineering, Optoelectronics, Electrical and Electronic Engineering, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::25363dc9d3003ea48a2fed18f90d9036
https://doi.org/10.1109/led.2010.2044477

المؤلفون: Yao-Chin Cheng, L S Huang, I. C. Chen, Eliot Chen, Osbert Cheng, Nathan Hui-Hsin Hsu, Huan-Chi Ma, S.Y. Lee, Jian-Wen You

المصدر: 2012 IEEE International Reliability Physics Symposium (IRPS).

مصطلحات موضوعية: Stress (mechanics), Materials science, business.industry, Component (thermodynamics), Logic gate, MOSFET, Analytical chemistry, Electrical engineering, Degradation (geology), business, Metal gate, Decoupling (electronics), High-κ dielectric

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ec1b510c4787341c10ebcf653f6d0b94
https://doi.org/10.1109/irps.2012.6241943

المؤلفون: G. P. Lin, C. L. Yang, H.-J. Gossmann, I. C. Chen, J. Y. Wu, Osbert Cheng, B. C. Hsu, W. J. Chen, C. H. Tsai, C. Fu, H. Y. Wang, C. T. Huang, C. I. Li, Benjamin Colombeau, S. Lu, T. Y. Lu, Y. S. Huang, B.N. Guo, Yao Chin Cheng, M. Chan

المصدر: Proceedings of Technical Program of 2012 VLSI Technology, System and Application.

مصطلحات موضوعية: Random access memory, Materials science, business.industry, Driving current, Monte Carlo method, Electronic engineering, Optoelectronics, Halo, Kinetic Monte Carlo, Static random-access memory, business, NMOS logic, Leakage (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::32bc04fb0b683c483706cf8727f0719f
https://doi.org/10.1109/vlsi-tsa.2012.6210167

المؤلفون: Chih-Yung Lin, J.W. Chou, K.C. Lin, Yao-Chin Cheng, C.T. Huang, Chun-Yen Chang, C. Chen

المصدر: Proceedings 2000 IEEE Hong Kong Electron Devices Meeting (Cat. No.00TH8503).

مصطلحات موضوعية: Ion implantation, Materials science, business.industry, Gate oxide, Polysilicon depletion effect, MOSFET, Electrical engineering, Optoelectronics, Short-channel effect, business, Metal gate, PMOS logic, Threshold voltage

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8e4622d13ddfe1256c12c97906cf6d4b
https://doi.org/10.1109/hkedm.2000.904212