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المؤلفون: Huimei Zhou, Miaomiao Wang, Nicolas Loubet, Andrew Gaul, Yasir Sulehria
المصدر: 2023 IEEE International Reliability Physics Symposium (IRPS).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d3609951e300ed8244bdd2d82f85c8e9
https://doi.org/10.1109/irps48203.2023.10117828 -
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المؤلفون: Takeshi Nogami, Oleg Gluschenkov, Yasir Sulehria, Son Nguyen, Brown Peethala, Huai Huang, Hosadurga Shobha, Nick Lanzillo, Raghuveer Patlolla, Devika Sil, Andrew Simon, Daniel Edelstein, Nelson Felix, Junjun Liu, Toshiyuki Tabata, Fulvio Mazzamuto, Sebastien Halty, Fabien Roze, Yasutoshi Okuno, Akira Uedono
المصدر: 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits).
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fe72a3442deaa820b16b410afc241c1c
https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830488 -
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المؤلفون: Balasubramanian S. Pranatharthi Haran, F. Mazzamuto, James Chingwei Li, Takeshi Nogami, Christian Lavoie, R. Cornell, James J. Demarest, Oleg Gluschenkov, Devika Sil, J. Liu, Jean Jordan-Sweet, V. Stanic, A. Simon, K. Huet, Yasir Sulehria
المصدر: 2021 IEEE International Interconnect Technology Conference (IITC).
مصطلحات موضوعية: Materials science, business.industry, Annealing (metallurgy), Nanosecond, Laser, Fluence, law.invention, law, Physical vapor deposition, Optoelectronics, Thin film, Forming gas, business, Sheet resistance
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::853faaf12dddd47e0d2283637fdb5917
https://doi.org/10.1109/iitc51362.2021.9537396 -
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المؤلفون: Juntao Li, Yasir Sulehria, Nicholas A. Lanzillo, Devika Sil, Joe Lee, James J. Kelly, Raghuveer R. Patlolla, Hosadurga Shobha, Anuja DeSilva, Prasad Bhosale, Takeshi Nogami, Oleg Gluschenkov, Lawrence A. Clevenger, Son Nguyen, Jennifer Church, Huai Huang, Balasubramanian S. Haran, Yann Mignot, James J. Demarest, Andrew H. Simon, Brown Peethala Dan Edelstein
المصدر: 2020 IEEE International Interconnect Technology Conference (IITC).
مصطلحات موضوعية: Grain growth, Materials science, Electrical resistivity and conductivity, Scattering, Volume fraction, Copper interconnect, Nanowire, Analytical chemistry, Grain boundary, Electron scattering
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b22fcf1415d54c5bfb077d80ab9af1cc
https://doi.org/10.1109/iitc47697.2020.9515628 -
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المؤلفون: Michael Willemann, Oleg Gluschenkov, Shaoyin Chen, Yasir Sulehria
المصدر: 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, Silicon, business.industry, Annealing (metallurgy), Transistor, chemistry.chemical_element, Nanosecond, Temperature measurement, law.invention, chemistry, law, Surface roughness, Optoelectronics, Wafer, Crystalline silicon, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::caf775f6d708817f616be14ba6abf586
https://doi.org/10.1109/asmc49169.2020.9185306 -
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المؤلفون: Willie Muchrison, Shanti Pancharatnam, Jean E. Wynne, Yasir Sulehria
المصدر: 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
مصطلحات موضوعية: Materials science, chemistry.chemical_element, 02 engineering and technology, equipment and supplies, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, Titanium nitride, Surface conditions, 0104 chemical sciences, Deposition rate, chemistry.chemical_compound, Atomic layer deposition, chemistry, Growth rate, Composite material, 0210 nano-technology, Tin
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::46afb2620affd64ecd77ea1c50b2c148
https://doi.org/10.1109/asmc.2019.8791816 -
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المؤلفون: Shaoyin Chen, Walter Kleemeier, Kevin W. Brew, Adra Carr, Oleg Gluschenkov, S. Choi, Curtis Durfee, Thirumal Thanigaivelan, Lan Yu, James J. Demarest, Yasir Sulehria, Jim Willis, Chengyu Niu, F. Lie, Heng Wu, Dechao Guo
المصدر: 2018 IEEE International Electron Devices Meeting (IEDM).
مصطلحات موضوعية: 010302 applied physics, Materials science, business.industry, Annealing (metallurgy), 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, CMOS, 0103 physical sciences, External resistance, Optoelectronics, Process window, Nanosecond laser, 0210 nano-technology, business
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::37feaa1a12a178d81ae9ac41858e1c4e
https://doi.org/10.1109/iedm.2018.8614628 -
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المؤلفون: Madhana Sunder, Shravan Matham, Anuja De Silva, Yiping Yao, Hao Truong, Abraham Arceo, Indira Seshadri, Yasir Sulehria, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda K. Kanakasabapathy, Kisup Chung, Brock Mendoza, Luciana Meli
المصدر: SPIE Proceedings.
مصطلحات موضوعية: 010302 applied physics, Materials science, Metal contamination, Nanotechnology, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, 0103 physical sciences, Electrical performance, Process window, Dry etching, 0210 nano-technology, Lithography, Scale down, Layer (electronics), Deposition (law)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::22e3e9c55551a3638db535479e95a21f
https://doi.org/10.1117/12.2258380 -
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المؤلفون: Nelson Felix, Luciana Meli, Shravan Matham, Heng Wu, Yiping Yao, Ruqiang Bao, Abraham Arceo, Sivananda K. Kanakasabapathy, Hoa Truong, Indira Seshadri, Kisup Chung, Brock Mendoza, Anuja De Silva, Madhana Sunder, Yasir Sulehria
المصدر: Journal of Micro/Nanolithography, MEMS, and MOEMS. 16:023504
مصطلحات موضوعية: Materials science, Mechanical Engineering, Nanotechnology, 02 engineering and technology, 010402 general chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Atomic and Molecular Physics, and Optics, 0104 chemical sciences, Electronic, Optical and Magnetic Materials, law.invention, Atomic layer deposition, Etching (microfabrication), law, Process window, Dry etching, Electrical and Electronic Engineering, Thin film, Photolithography, 0210 nano-technology, Layer (electronics), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::0a94ec9e6018cdcd311e93498c599029
https://doi.org/10.1117/1.jmm.16.2.023504