نتائج البحث - "Yasutaka Morikawa"

1

Mask 3D effect reduction and defect printability of etched multilayer EUV mask

المؤلفون: Shunko Magoshi, Satoshi Tanaka, Susumu Iida, Takashi Kamo, Takayuki Uchiyama, Yasutaka Morikawa, Takeshi Yamane

المصدر: Extreme Ultraviolet (EUV) Lithography X.

مصطلحات موضوعية: Reduction (complexity), Materials science, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, Optoelectronics, business, Lithography, Small field

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6c087f180a3305c18a54f40ce7922141
https://doi.org/10.1117/12.2515273

2

Influence of mask line width roughness on programmed pattern defect printability

المؤلفون: Takeshi Yamane, Takashi Kamo, Yasutaka Morikawa

المصدر: Extreme Ultraviolet (EUV) Lithography X.

مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, Significant difference, technology, industry, and agriculture, Tantalum, chemistry.chemical_element, Surface finish, Line width, chemistry, Optoelectronics, Wafer, Defect size, business, Critical dimension

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b7411c235dd5a895349d0afe4b0b8221
https://doi.org/10.1117/12.2515145

3

مؤتمر

Mask 3D effect reduction and defect printability of etched multilayer EUV mask.

المؤلفون: Takashi Kamo, Takeshi Yamane, Yasutaka Morikawa, Susumu Iida, Takayuki Uchiyama, Shunko Magoshi, Satoshi Tanaka

المصدر: Proceedings of SPIE; 1/20/2019, Vol. 10957, p109571C-1-109571C-6, 6p

4

Lithographic performance of a new 'low-k' mask

المؤلفون: Ayako Tani, Takashi Adachi, Katsuya Hayano, Yukihiro Fujimura, Yukio Inazuki, Yasutaka Morikawa, Yoshio Kawai, Hiroyuki Miyashita

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Optics, Materials science, Excimer laser, business.industry, medicine.medical_treatment, medicine, Phase-shift mask, business, Phase shift module, Lithography, Blank, Exposure latitude, Next-generation lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::dbcc193a1068963d819d2639c4d189b9
https://doi.org/10.1117/12.2242870

5

Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width

المؤلفون: Kosuke Takai, Noriko Iida, Yasutaka Morikawa, Naoya Hayashi, Takashi Kamo

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Pattern size, Fabrication, Optics, Materials science, Resist, business.industry, Extreme ultraviolet lithography, Resolution (electron density), Line (geometry), Pillar, Optoelectronics, Wafer, business

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::8be1551e57bddbbef93c0d59093d228b
https://doi.org/10.1117/12.2242872

6

Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?

المؤلفون: Hidehiro Watanabe, Yasutaka Morikawa, Tsukasa Abe, Ryoichi Hirano, Tsuyoshi Amano, Susumu Iida

المصدر: Extreme Ultraviolet (EUV) Lithography VII.

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::bef8c2ca33ddb7610fe43d8586f604ff
https://doi.org/10.1117/12.2218940

7

Process capability of etched multilayer EUV mask

المؤلفون: Noriko Iida nee Sakurai, Kosuke Takai, Yasutaka Morikawa, Takashi Kamo, Naoya Hayashi

المصدر: SPIE Proceedings.

مصطلحات موضوعية: Pattern size, Optics, Materials science, Passivation, business.industry, Process capability, Extreme ultraviolet lithography, Optoelectronics, Particle, business, Lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::25ac845d40d34d3e6202bc3bd7c1bd9f
https://doi.org/10.1117/12.2197686

8

Development of new high transmission eaPSM for Negative Tone Development process on wafer

المؤلفون: Hiroyuki Miyashita, Yukihiro Fujimura, Yasutaka Morikawa, Takashi Adachi, Katsuya Hayano, Shingo Yoshikawa, Ayako Tani, Yoichi Miura

المصدر: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII.

مصطلحات موضوعية: Engineering, Excimer laser, business.industry, medicine.medical_treatment, Process (computing), Tone (musical instrument), Optics, medicine, Phase-shift mask, Wafer, Node (circuits), business, Lithography, Immersion lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::31a8a9949d8b78f746c2a4354ecf3dd9
https://doi.org/10.1117/12.2197611

9

مؤتمر

Blank Defect Coverage Budget For 16nm Half-Pitch Single EUV Exposure.

المؤلفون: Rik Jonckheere, Takeshi Yamane, Yasutaka Morikawa, Takashi Kamo

المصدر: Proceedings of SPIE; 8/23/2018, Vol. 10807, p1-8, 8p

10

مؤتمر

Fabrication of Ta based absorber EUV mask with SRAF.

المؤلفون: Keiko Morishita, Kosuke Takai, Kenji Masui, Takashi Kamo, Tsukasa Abe, Yasutaka Morikawa, Naoya Hayashi

المصدر: Proceedings of SPIE; 8/23/2018, Vol. 10807, p1-6, 6p

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