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المؤلفون: Masafumi Hori, Hisashi Nakagawa, Takehiko Naruoka, Takakazu Kimoto, Tomoki Nagai, Tomohisa Fujisawa, Toru Kimura, Ramakrishnan Ayothi, Motohiro Shiratani, Kenji Hoshiko, Yoshi Hishiro
المصدر: Journal of Photopolymer Science and Technology. 28:519-523
مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Extreme ultraviolet lithography, Organic Chemistry, Semiconductor device, Optics, Resist, Extreme ultraviolet, Materials Chemistry, Optoelectronics, X-ray lithography, business, Lithography, Electron-beam lithography, Immersion lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d8ba0c24a673d40d672c9059f8583ed0
https://doi.org/10.2494/photopolymer.28.519 -
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المؤلفون: Hisashi Nakagawa, Tsuyoshi Furukawa, Satoshi Dei, Hiromu Miyata, Masafumi Hori, Yoshi Hishiro, Motohiro Shiratani, Takehiko Naruoka, Tomoki Nagai, Ramakrishnan Ayothi
المصدر: Extreme Ultraviolet (EUV) Lithography VIII.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, 02 engineering and technology, Surface finish, Photoresist, 010402 general chemistry, 021001 nanoscience & nanotechnology, 01 natural sciences, 0104 chemical sciences, Interference lithography, Optics, Resist, Extreme ultraviolet, Sensitivity (control systems), 0210 nano-technology, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1c8f2075f59865491c31795839819a9a
https://doi.org/10.1117/12.2258164 -
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المؤلفون: Yoshi Hishiro, Yusuke Anno, Xavier Buch, Tomoki Nagai, Kenichi Izumi, Yuji Namie, Shinya Minegishi, Takehiko Naruoka
المصدر: Journal of Photopolymer Science and Technology. 26:27-30
مصطلحات موضوعية: Directed self assembly, Materials science, Polymers and Plastics, Organic Chemistry, Materials Chemistry, Nanotechnology, Material development, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::24417db7fce3afe930b631c867203555
https://doi.org/10.2494/photopolymer.26.27 -
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المؤلفون: Yoshi Hishiro, Xavier Buch, Motohiro Shiratani, Ken Maruyama, Kenji Hoshiko, Tooru Kimura, Andreia Santos, Takehiko Naruoka, Ramakrishnan Ayothi
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Contact angle, Outgassing, Optics, Materials science, Semiconductor, Resist, business.industry, Extreme ultraviolet lithography, Extreme ultraviolet, business, Lithography, Electron-beam lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::a48eb7d465c4f697f6aa623a8b3c6cbd
https://doi.org/10.1117/12.2046133 -
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المؤلفون: Greg Breyta, Wakamatsu Goji, Krishna M. Bajjuri, Anuja DeSilva, Noel Arellano, Ananthakrishnan Sankaranarayanan, Tooru Kimura, Tomoki Nagai, Yoshikazu Yamaguchi, Carl E. Larson, Yoshio Takimoto, Luisa D. Bozano, Martin Glodde, Yoshi Hishiro, Tsutomu Shimokawa, Srinivasan Balakrishnan, Daniel P. Sanders, Kazuhiko Komura
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, business.industry, Thermal resistance, Chemical-mechanical planarization, Deposition (phase transition), Optoelectronics, Nanotechnology, Substrate (printing), Chemical vapor deposition, Photoresist, Material properties, business, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::701fd6c39eb0e5fc3215bb38976f19e4
https://doi.org/10.1117/12.2046357 -
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المؤلفون: Tsutomu Shimokawa, Yoshi Hishiro, Tomoki Nagai, Yoshikazu Yamaguchi, Motoyuki Shima, Yoshio Takimoto, Tooru Kimura
المصدر: SPIE Proceedings.
مصطلحات موضوعية: law, Computer science, Extreme ultraviolet lithography, Electronic engineering, Photomask, Photolithography, Simulation, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::f8d73f2b8510c163a9f0215aaa2bb0d2
https://doi.org/10.1117/12.2014526 -
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المؤلفون: Ken Maruyama, Tooru Kimura, Koji Inukai, Ayothia Ramkrichnan, Takanori Kawakami, Yoshi Hishiro
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Polymers and Plastics, Silicon, business.industry, Extreme ultraviolet lithography, Organic Chemistry, chemistry.chemical_element, Nanotechnology, Radiation, Optics, chemistry, Resist, Scientific method, Extreme ultraviolet, Materials Chemistry, business, Absorption (electromagnetic radiation), Lithography, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::054b3582b15a35a1e0c99d4339e7a1c4
https://doi.org/10.1117/12.2011243 -
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المؤلفون: Tomoki Nagai, Yusuke Anno, Yuuji Namie, Yoshikazu Yamaguchi, Yoshi Hishiro, Takehiko Naruoka, Shinya Minegishi
المصدر: Alternative Lithographic Technologies V.
مصطلحات موضوعية: Directed self assembly, chemistry.chemical_classification, Materials science, chemistry, Polymer, Polymer blend, Photoresist, Composite material, Contact hole
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::57a4a035b894c3d7a017d360590b6a49
https://doi.org/10.1117/12.2011418 -
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المؤلفون: Shalini Sharma, Hiroki Nakagawa, Ken Maruyama, Tooru Kimura, Yoshi Hishiro, Makoto Shimizu
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Contact angle, Optics, Materials science, Resist, business.industry, Extreme ultraviolet, Extreme ultraviolet lithography, Resolution (electron density), Photoresist, Diffusion (business), business, Layer (electronics)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::b6d88deeb5408dfcd3c30ae0cd92a0fb
https://doi.org/10.1117/12.916555 -
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المؤلفون: Greg Breyta, Masayuki Motonari, Yoshi Hishiro, Taiichi Furukawa, Goji Wakamatsu, Luisa D. Bozano, Satoru Murakami, Ratnam Sooriyakumaran, Noel Arellano, Martin Glodde, Carl E. Larson, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Kentaro Goto, Anuja DeSilva
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Materials science, Resist, Semiconductor device fabrication, law, Chemical-mechanical planarization, Thermal resistance, Extreme ultraviolet lithography, Multiple patterning, Nanotechnology, Chemical vapor deposition, Photolithography, law.invention
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::1a1c8cf7db597584dffd1b176cff64f9
https://doi.org/10.1117/12.915698