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المؤلفون: Yoshi Hishiro, Yusuke Anno, Xavier Buch, Tomoki Nagai, Kenichi Izumi, Yuji Namie, Shinya Minegishi, Takehiko Naruoka
المصدر: Journal of Photopolymer Science and Technology. 26:27-30
مصطلحات موضوعية: Directed self assembly, Materials science, Polymers and Plastics, Organic Chemistry, Materials Chemistry, Nanotechnology, Material development, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::24417db7fce3afe930b631c867203555
https://doi.org/10.2494/photopolymer.26.27 -
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المؤلفون: Shinya Minegishi, Yusuke Anno, Tomoki Nagai, Yuji Namie
المصدر: Journal of Photopolymer Science and Technology. 25:21-25
مصطلحات موضوعية: Directed self assembly, Materials science, Polymers and Plastics, Organic Chemistry, Materials Chemistry, Nanotechnology, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::40f893732f24f568035d4c44ddba6f9b
https://doi.org/10.2494/photopolymer.25.21 -
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المؤلفون: Yusuke Anno, Motoyuki Shima, Kazuyuki Kasahara
المصدر: Journal of Photopolymer Science and Technology. 24:219-225
مصطلحات موضوعية: Materials science, Polymers and Plastics, Extreme ultraviolet lithography, Organic Chemistry, Nanotechnology, Photoresist, law.invention, Resist, law, Materials Chemistry, Multiple patterning, Photolithography, Lithography, Immersion lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7c6fb2d39f80094d76851ae01af09031
https://doi.org/10.2494/photopolymer.24.219 -
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المؤلفون: Tsutomu Shimokawa, Michihiro Mita, Yoshikazu Yamaguchi, Kenji Hoshiko, Hiromitsu Tanaka, Yukio Nishimura, Goji Wakamatsu, Yusuke Anno, Hitoshi Osaki, Tomohisa Fujisawa, Makoto Sugiura, Koji Ito
المصدر: Journal of Photopolymer Science and Technology. 23:199-204
مصطلحات موضوعية: Materials science, Polymers and Plastics, business.industry, Organic Chemistry, Process (computing), Nanotechnology, Photoresist, Lithography process, Resist, Materials Chemistry, Multiple patterning, Process engineering, business, Critical dimension, Throughput (business), Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::3bc04fd43b4f59e91d6036339a3a9683
https://doi.org/10.2494/photopolymer.23.199 -
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المؤلفون: Yoshikazu Yamaguchi, Kenji Hoshiko, Shiro Kusumoto, Yusuke Anno, Masafumi Hori, Tsutomu Shimokawa, Goji Wakamatsu, Koichi Fujiwara, Michihiro Mita, Tomohiko Kakizawa, Takeo Shio
المصدر: Journal of Photopolymer Science and Technology. 22:641-646
مصطلحات موضوعية: Materials science, Polymers and Plastics, Resist, Etching (microfabrication), Organic Chemistry, Materials Chemistry, Process (computing), Multiple patterning, Process window, Nanotechnology, Throughput (business), Critical dimension, Lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::954cb83eb6a7abe03543071670a3da25
https://doi.org/10.2494/photopolymer.22.641 -
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المؤلفون: Kazuki Daimatsu, Katsuhiro Inomata, Hideki Sugimoto, Kazuki Yokoi, Tomoki Ikeda, Eiji Nakanishi, Yusuke Anno
المصدر: Journal of Applied Polymer Science. 108:362-369
مصطلحات موضوعية: Materials science, Polymers and Plastics, General Chemistry, Methacrylate, Macromonomer, Isocyanate, Surfaces, Coatings and Films, Styrene, chemistry.chemical_compound, Silicone, chemistry, Polymer chemistry, Materials Chemistry, Copolymer, Polystyrene, Hybrid material
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المؤلفون: Koichi Fujiwara, Makoto Sugiura, Yoshikazu Yamaguchi, Tomohiro Kakizawa, Yusuke Anno, Akimasa Soyano, Atsushi Nakamura, Masafumi Hori, Tsutomu Shimokawa
المصدر: Journal of Photopolymer Science and Technology. 21:691-696
مصطلحات موضوعية: Depth of focus, Research groups, Materials science, Polymers and Plastics, Etching (microfabrication), Organic Chemistry, Materials Chemistry, Multiple patterning, Process (computing), Nanotechnology, Throughput (business), Lithography, Exposure latitude
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::848e84849a9888a4972a2461a71cdbd1
https://doi.org/10.2494/photopolymer.21.691 -
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المؤلفون: Kenji Hoshiko, Yusuke Anno, Vassilios Constantoudis, Roel Gronheid, John J. Biafore, Alessandro Vaglio Pret, Todd R. Younkin, Gustaf Winroth
المصدر: Extreme Ultraviolet (EUV) Lithography IV.
مصطلحات موضوعية: Materials science, business.industry, Extreme ultraviolet lithography, law.invention, Optics, Resist, law, Multiple patterning, Optoelectronics, X-ray lithography, Photolithography, business, Electron-beam lithography, Immersion lithography, Next-generation lithography
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::50dbc927071d10d6fc3af3ab67fef4aa
https://doi.org/10.1117/12.2011584 -
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المؤلفون: Tomoki Nagai, Yusuke Anno, Yuuji Namie, Yoshikazu Yamaguchi, Yoshi Hishiro, Takehiko Naruoka, Shinya Minegishi
المصدر: Alternative Lithographic Technologies V.
مصطلحات موضوعية: Directed self assembly, chemistry.chemical_classification, Materials science, chemistry, Polymer, Polymer blend, Photoresist, Composite material, Contact hole
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::57a4a035b894c3d7a017d360590b6a49
https://doi.org/10.1117/12.2011418 -
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المؤلفون: Yusuke Anno, Yutaka Kozuma, Yoshifumi Ogawa, Kentaro Goto, Hiromitsu Tanaka, Kenji Hoshiko, Hiroaki Takikawa, Koichi Fujiwara, Makoto Sugiura, Masafumi Hori, Koji Ito, Goji Wakamatsu, Tsutomu Shimokawa, Tomohisa Fujisawa, Takeo Shioya, Yoshikazu Yamaguchi, Michihiro Mita
المصدر: SPIE Proceedings.
مصطلحات موضوعية: Resist, Computer science, business.industry, Process (computing), Multiple patterning, Nanotechnology, Lithography process, Process engineering, business, Lithography, Critical dimension, Throughput (business), Simple (philosophy)
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::e5ebe214fe0ebc7d13b50341fce070c4
https://doi.org/10.1117/12.846493