المؤلفون: Cui, Zheng^Aff2

المساهمون: Cui, Zheng^Aff1

المصدر: Nanofabrication : Principles, Capabilities and Limits. :349-381

المؤلفون: Löfstrand, Anette, Jafari Jam, Reza, Mothander, Karolina, Nylander, Tommy, Mumtaz, Muhammad, Vorobiev, Alexei, Chen, Wen Chang, Borsali, Redouane, Maximov, Ivan

المصدر: ACS Applied Nano Materials NanoLund: Centre for Nanoscience. 4(5):5141-5151

مصطلحات موضوعية: block copolymer lithography, carbohydrate, maltoheptaose, neutron reflectometry, reactive ion etching, sequential infiltration synthesis, sub-10 nm pattern transfer, Teknik, Nanoteknik, Engineering and Technology, Nano Technology, Naturvetenskap, Fysik, Den kondenserade materiens fysik, Natural Sciences, Physical Sciences, Condensed Matter Physics, Annan fysik, Other Physics Topics, Kemiteknik, Polymerteknologi, Chemical Engineering, Polymer Technologies

URL الوصول: https://lup.lub.lu.se/record/0ee71869-db3a-49e8-bcd8-bbcec34c00bb
http://dx.doi.org/10.1021/acsanm.1c00582

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المؤلفون: Landeke-Wilsmark, Björn, Hägglund, Carl, 1975

المصدر: Nanotechnology. 33(32)

مصطلحات موضوعية: lift-off, water-soluble sacrificial layer, nanoparticle arrays, noble metal nanoparticles, nanoporous template, self-assembly, block copolymer lithography

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-476180
https://doi.org/10.1088/1361-6528/ac64b1
https://uu.diva-portal.org/smash/get/diva2:1666503/FULLTEXT01.pdf

المساهمون: Nealey, Paul [Univ. of Chicago, IL (United States). Inst. for Molecular Engineering; Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division]

المصدر: Journal of Photopolymer Science and Technology; 29; 5

وصف الملف: Medium: ED; Size: p. 653-657

URL الوصول: http://www.osti.gov/scitech/servlets/purl/1352873

المؤلفون: de Souza, C. F., Alizadeh, A., Nair, S., Saveliev, I., Blumin, M., Ruda, H. E., Hays, D. C., Watkins, V. H., Conway, K. R., Braunstein, E.

المصدر: IEEE Journal of Quantum Electronics IEEE J. Quantum Electron. Quantum Electronics, IEEE Journal of. 46(5):832-836 May, 2010

المساهمون: Mirkin, Chad [Northwestern Univ., Evanston, IL (United States)]

المصدر: ACS Nano; 9; 12; Other Information: CBES partners with Northwestern University (lead); Harvard University; New York University; Pennsylvania State University; University of Michigan; University of Pittsburgh

وصف الملف: Medium: ED; Size: p. 12137-12145

URL الوصول: http://www.osti.gov/scitech/servlets/purl/1371160

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المؤلفون: Samantaray, C. B.^Aff1

المساهمون: Kumar, Challa S. S. R., editor^Aff10

المصدر: Surface Science Tools for Nanomaterials Characterization. :91-115

المؤلفون: Simon Kim, Su Eon Lee, Jun Hyun Park, Jin Yong Shin, Bom Lee, Heo Yeon Lim, Young Taek Oh, Jun Pyo Hwang, Seung Won Seon, Seung Hee Kim, Tae Sang Yu, Bong Hoon Kim

المصدر: Polymers, Vol 13, Iss 4, p 566 (2021)

مصطلحات موضوعية: block copolymer lithography, nanopatterning, two-dimensional (2D) materials, substrate effect, suspended structure, Organic chemistry, QD241-441

وصف الملف: electronic resource

Relation: https://www.mdpi.com/2073-4360/13/4/566; https://doaj.org/toc/2073-4360

URL الوصول: https://doaj.org/article/6a91dd6804f1409f9e4c9d8da863b67c