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1دورية أكاديميةEvaluation of zirconia surfaces and shear bond strength after acid–etching with ultrasonic vibration
المؤلفون: Xiaozhen Zhang, Hepeng Nie, Jiaxin Lv, Shanshan Yuan, Juan Wang, Kunzhan Cai, Jin Wu, Qingqing Zhang, Chunbo Tang
المصدر: Materials Research Express, Vol 11, Iss 2, p 025401 (2024)
مصطلحات موضوعية: zirconia, surface treatment, hydrofluoric acid etching, microstructure, shear bond strength, ultrasonic vibration corrosion, Materials of engineering and construction. Mechanics of materials, TA401-492, Chemical technology, TP1-1185
وصف الملف: electronic resource
Relation: https://doaj.org/toc/2053-1591
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2دورية أكاديمية
المؤلفون: Cristiana Cuzic, Anca Jivanescu, Radu Marcel Negru, Iosif Hulka, Mihai Rominu
المصدر: Materials, Vol 16, Iss 12, p 4303 (2023)
مصطلحات موضوعية: glass–ceramic, hydrofluoric acid etching, surface treatment, adhesion, scanning electron microscopy, surface roughness, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
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3دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
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4دورية أكاديمية
المؤلفون: So-Hyun Kim, Sung-Chan Cho, Myung-Hyun Lee, Hyo-Jung Kim, Nam-Sik Oh
المصدر: Medicina, Vol 58, Iss 10, p 1469 (2022)
مصطلحات موضوعية: hydrofluoric acid etching, resin cement, shear bond strength, zirconia ceramics, zirconia surface treatment, Medicine (General), R5-920
وصف الملف: electronic resource
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5دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
6دورية أكاديمية
لا يتم عرض هذه النتيجة على الضيوف.
تسجيل الدخول للوصول الكامل. -
7دورية أكاديمية
المؤلفون: Matilde Almiro, Beatriz Marinho, António H. S. Delgado, João Rua, Paulo Monteiro, Inês Caetano Santos, Luís Proença, José João Mendes, Marco M. M. Gresnigt
المصدر: Materials, Vol 15, Iss 6, p 2045 (2022)
مصطلحات موضوعية: bond strength, CAD/CAM, hydrofluoric acid etching, lithium disilicate, silane treatment, surface treatment, Technology, Electrical engineering. Electronics. Nuclear engineering, TK1-9971, Engineering (General). Civil engineering (General), TA1-2040, Microscopy, QH201-278.5, Descriptive and experimental mechanics, QC120-168.85
وصف الملف: electronic resource
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المؤلفون: Rominu, Cristiana Cuzic, Anca Jivanescu, Radu Marcel Negru, Iosif Hulka, Mihai
المصدر: Materials; Volume 16; Issue 12; Pages: 4303
مصطلحات موضوعية: glass–ceramic, hydrofluoric acid etching, surface treatment, adhesion, scanning electron microscopy, surface roughness, shear bond strength
وصف الملف: application/pdf
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المؤلفون: E. Brezza, F. Deprat, C. de Buttet, A. Gauthier, M. Gregoire, D. Guiheux, V. Guyader, M. Juhel, I. Berbezier, E. Assaf, L. Favre, P. Chevalier, C. Gaquière, N. Defrance
المساهمون: STMicroelectronics [Crolles] (ST-CROLLES), Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Université catholique de Lille (UCL)-Université catholique de Lille (UCL), Puissance - IEMN (PUISSANCE - IEMN), Université catholique de Lille (UCL)-Université catholique de Lille (UCL)-Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Laboratoire Cycles Géochimiques et ressources (LCG), Géosciences Marines (GM), Institut Français de Recherche pour l'Exploitation de la Mer (IFREMER)-Institut Français de Recherche pour l'Exploitation de la Mer (IFREMER), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Hôpital Louis Pradel [CHU - HCL], Hospices Civils de Lyon (HCL), Declaration of competing interestThe authors declare that they have no known competing financial interests or personal relationships that could have appeared toinfluence the work reported in this paper., NO FUNDING FOUND, Laboratoire commun STMicroelectronics-IEMN T1
المصدر: Solid-State Electronics
Solid-State Electronics, 2023, 204, pp.108654. ⟨10.1016/j.sse.2023.108654⟩مصطلحات موضوعية: [PHYS]Physics [physics], [SPI]Engineering Sciences [physics], Materials Chemistry, Heterojunction Bipolar Transistor, Thermal treatment, Electrical and Electronic Engineering, Interface, SiconiTM etching, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Hydrofluoric acid etching
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10دورية أكاديمية
المصدر: International Journal of Nanomedicine, Vol Volume 12, Pp 1317-1328 (2017)
مصطلحات موضوعية: hydrofluoric acid etching, surface modification, micro/nano- structures, osteogenic activity, Medicine (General), R5-920
وصف الملف: electronic resource