مؤتمر
Process control for 45 nm CMOS logic gate patterning.
| العنوان: | Process control for 45 nm CMOS logic gate patterning. |
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| المؤلفون: | Le Gratiet, Bertrand, Gouraud, Pascal, Aparicio, Enrique, Babaud, Laurene, Dabertrand, Karen, Touchet, Mathieu, Kremer, Stephanie, Chaton, Catherine, Foussadier, Franck, Sundermann, Frank, Massin, Jean, Chapon, Jean-Damien, Gatefait, Maxime, Minghetti, Blandine, de-Caunes, Jean, Boutin, Daniel |
| المصدر: | Proceedings of SPIE; Nov2008 Part 2, Issue 1, p69220Z-69220Z-11, 11p |
| قاعدة البيانات: | Complementary Index |
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