دورية أكاديمية
The synthesis mechanism of complex oxide films formed in dense RF — plasma by reactive sputtering of stoichiometric targets.
| العنوان: | The synthesis mechanism of complex oxide films formed in dense RF — plasma by reactive sputtering of stoichiometric targets. |
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| المؤلفون: | Mukhortov, V. M., Golovko, Y. I., Tolmachev, G. N., Klevtzov, A. N. |
| المصدر: | Ferroelectrics; Aug2000, Vol. 247 Issue 1, p75-83, 9p |
| قاعدة البيانات: | Complementary Index |
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Full Text Finder | تدمد: | 00150193 |
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| DOI: | 10.1080/00150190008214943 |