التفاصيل البيبلوغرافية
| العنوان: |
Kinetics of phosphorus proximity rapid thermal diffusion using spin-on dopant source for shallow junctions fabrication. |
| المؤلفون: |
Grabiec, P. B., Zagozdzon-Wosik, W., Lux, G. |
| المصدر: |
Journal of Applied Physics; 7/1/1995, Vol. 78 Issue 1, p204, 8p, 1 Diagram, 11 Graphs |
| مصطلحات موضوعية: |
RAPID thermal processing, THERMAL diffusivity |
| مستخلص: |
Presents a study that investigated proximity rapid thermal diffusion using phosphorus spin-on dopants (SOD). Analysis of the process kinetics; Factor which control the process at low diffusion temperature; Diffusion of dopant and its concentration distribution in the SOD. |
| قاعدة البيانات: |
Complementary Index |
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