مؤتمر
Electromigration Performance of Fluorinated Aluminum Films for VLSI Applications.
| العنوان: | Electromigration Performance of Fluorinated Aluminum Films for VLSI Applications. |
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| المؤلفون: | MacWilliams, K. P., Yamada, W. E., Brown, S., Yabiku, G. K., Lowry, L., Isaac, M. |
| المصدر: | MRS Online Proceedings Library; 02/07/1992, Vol. 265, pN.PAG-1, 1p |
| قاعدة البيانات: | Complementary Index |
Find this article in full text from Springer Verlag. | تدمد: | 19464274 |
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| DOI: | 10.1557/PROC-265-125 |