Post SiN Etching Cleaning During Copper and Low K Integration

التفاصيل البيبلوغرافية
العنوان: Post SiN Etching Cleaning During Copper and Low K Integration
المؤلفون: Beverina, Alessio, Louis, Didier, Arvet, C., Lajoinie, E., Besson, Pascal, Peyne, C., Holmes, Douglas, Maloney, D., Lee, S., Lee, W.M.
المصدر: Diffusion and Defect Data Part B: Solid State Phenomena; January 2001, Vol. 76 Issue: 1 p101-104, 4p
مستخلص: Not Available
قاعدة البيانات: Supplemental Index
الوصف
تدمد:10120394
DOI:10.4028/www.scientific.net/SSP.76-77.101