دورية
Combined AFM and laser lithography on hydrogen-passivated amorphous silicon
| العنوان: | Combined AFM and laser lithography on hydrogen-passivated amorphous silicon |
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| المؤلفون: | Birkelund, Karen, Mu¨llenborn, Matthias, Grey, Franc¸ois, Jensen, Flemming, Madsen, Steen |
| المصدر: | Superlattices and Microstructures; December, 1996, Vol. 20 Issue: 4 p555-560, 6p |
| مستخلص: | We report a novel combination of AFM lithography and laser direct writing on hydrogen-passivated amorphous silicon surfaces to fabricate combined silicon milli-, micro- and nanostructures. Selective oxidation is performed by focusing a laser beam (λ=458 nm) on a hydrogen-terminated silicon surface, forming the millimetre-size contact pads for connection of nanometre-scale patterns. The nanostructures are made by electric-field-enhanced oxidation using a contact mode AFM equipped with a metal-coated tip. Both techniques are based on selective oxidation of hydrogen-passivated amorphous silicon, where the oxide is used as an etch mask in a single etch step. The lithographic process has also been demonstrated using a reflection mode scanning near-field optical microscope with an uncoated fiber probe. |
| قاعدة البيانات: | Supplemental Index |
Full Text Finder | تدمد: | 07496036 10963677 |
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| DOI: | 10.1006/spmi.1996.0114 |