Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method
| العنوان: | Advanced atomic layer deposition: metal oxide thin film growth using the discrete feeding method |
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| المؤلفون: | Jae Chan Park, Chang Ik Choi, Sang-Gil Lee, Seung Jo Yoo, Ji-Hyun Lee, Jae Hyuck Jang, Woo-Hee Kim, Ji-Hoon Ahn, Jeong Hwan Kim, Tae Joo Park |
| المصدر: | Journal of Materials Chemistry C. 11:1298-1303 |
| بيانات النشر: | Royal Society of Chemistry (RSC), 2023. |
| سنة النشر: | 2023 |
| مصطلحات موضوعية: | Materials Chemistry, General Chemistry |
| الوصف: | A HfO2 film was grown using discrete feeding ALD, an advanced ALD process designed to improve the surface coverage of the precursor, which decreased the residual impurities in the film and increased the film density. |
| تدمد: | 2050-7534 2050-7526 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::eec33e7b0762b19649ddf2b074826ebe https://doi.org/10.1039/d2tc03485a |
| حقوق: | CLOSED |
| رقم الأكسشن: | edsair.doi...........eec33e7b0762b19649ddf2b074826ebe |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 20507534 20507526 |
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