Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source
| العنوان: | Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source |
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| المؤلفون: | T. Gaulain, Agnès Granier, Simon Bulou, Patrick Choquet, Antoine Goullet, Mireille Richard-Plouet, W. Ravisy, B. Dey |
| المساهمون: | Luxembourg Institute of Science and Technology (LIST), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN) |
| المصدر: | Scientific Reports Scientific Reports, Nature Publishing Group, 2020, 10 (1), ⟨10.1038/s41598-020-78956-1⟩ Scientific Reports, Vol 10, Iss 1, Pp 1-11 (2020) |
| بيانات النشر: | HAL CCSD, 2020. |
| سنة النشر: | 2020 |
| مصطلحات موضوعية: | Anatase, Materials science, Science, 02 engineering and technology, Substrate (electronics), 010402 general chemistry, 01 natural sciences, Article, Deposition (phase transition), Gas composition, Photocatalysis, Thin film, ComputingMilieux_MISCELLANEOUS, Multidisciplinary, business.industry, Plasma, 021001 nanoscience & nanotechnology, 0104 chemical sciences, 13. Climate action, Duty cycle, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], Optoelectronics, Medicine, 0210 nano-technology, business, Materials for energy and catalysis |
| الوصف: | Photocatalytic surfaces have the potentiality to respond to many of nowadays societal concerns such as clean H2 generation, CO2 conversion, organic pollutant removal or virus inactivation. Despite its numerous superior properties, the wide development of TiO2 photocatalytic surfaces suffers from important drawbacks. Hence, the high temperature usually required (> 450 °C) for the synthesis of anatase TiO2 is still a challenge to outreach. In this article, we report the development and optimisation of an ECWR-PECVD process enabling the deposition of anatase TiO2 thin films at low substrate temperature. Scanning of experimental parameters such as RF power and deposition time was achieved in order to maximise photocatalytic activity. The careful selection of the deposition parameters (RF power, deposition time and plasma gas composition) enabled the synthesis of coatings exhibiting photocatalytic activity comparable to industrial references such as P25 Degussa and Pilkington Activ at a substrate temperature below 200 °C. In addition, to further decrease the substrate temperature, the interest of pulsing the plasma RF source was investigated. Using a duty cycle of 50%, it is thus possible to synthesise photocatalytic anatase TiO2 thin films at a substrate temperature below 115 °C with a deposition rate around 10 nm/min. |
| اللغة: | English |
| تدمد: | 2045-2322 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c422ce7bc31634dfb2f5b963bc698359 https://hal.archives-ouvertes.fr/hal-03109840/file/s41598-020-78956-1.pdf |
| حقوق: | OPEN |
| رقم الأكسشن: | edsair.doi.dedup.....c422ce7bc31634dfb2f5b963bc698359 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 20452322 |
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