Suspended dry pick-up and flip-over assembly for van der Waals heterostructures with ultra-clean surfaces

التفاصيل البيبلوغرافية
العنوان: Suspended dry pick-up and flip-over assembly for van der Waals heterostructures with ultra-clean surfaces
المؤلفون: Jin, Keda, Wichmann, Tobias, Wenzel, Sabine, Samuely, Tomas, Onufriienko, Oleksander, Szabó, Pavol, Watanabe, Kenji, Taniguchi, Takashi, Yan, Jiaqiang, Tautz, F. Stefan, Lüpke, Felix, Ternes, Markus, Martinez-Castro, Jose
المصدر: Adv. Mater. Interfaces 2023, 2300658
سنة النشر: 2023
المجموعة: Condensed Matter
مصطلحات موضوعية: Condensed Matter - Mesoscale and Nanoscale Physics
الوصف: Van der Waals heterostructures are an excellent platform for studying intriguing interface phenomena, such as moir\'e and proximity effects. Surface science techniques like scanning tunneling microscopy (STM) have proven a powerful tool to study such heterostructures but have so far been hampered because of their high sensitivity to surface contamination. Here, we report a dry polymer-based assembly technique to fabricate van der Waals heterostructures with atomically clean surfaces. The key features of our suspended dry pick-up and flip-over technique are 1) the heterostructure surface never comes into contact with polymers, 2) it is entirely solvent-free, 3) it is entirely performed in a glovebox, and 4) it only requires temperatures below 130$^{\circ}$. By performing ambient atomic force microscopy and atomically-resolved scanning tunneling microscopy on example heterostructures, we demonstrate that we can fabricate air-sensitive heterostructures with ultra-clean interfaces and surfaces. Due to the lack of polymer melting, the technique is further compatible with heterostructure assembly under ultra-high vacuum conditions, which promises ultimate heterostructure quality.
نوع الوثيقة: Working Paper
DOI: 10.1002/admi.202300658
URL الوصول: http://arxiv.org/abs/2306.10305
رقم الأكسشن: edsarx.2306.10305
قاعدة البيانات: arXiv