Polarity Dependency and 1/E Model of Gate Oxide TDDB Degradation in 3D NAND

التفاصيل البيبلوغرافية
العنوان: Polarity Dependency and 1/E Model of Gate Oxide TDDB Degradation in 3D NAND
المؤلفون: Qu, Lina, Yang, Shengwei, He, Ming, Fang, Rui, Zhu, Xiaojuan, Han, Kun, He, Yi
المصدر: 2023 IEEE International Reliability Physics Symposium (IRPS) Reliability Physics Symposium (IRPS), 2023 IEEE International. :1-4 Mar, 2023
Relation: 2023 IEEE International Reliability Physics Symposium (IRPS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781665456722
تدمد:19381891
DOI:10.1109/IRPS48203.2023.10117688