Re-defining reliability assessment per new intra-via Cu leakage degradation

التفاصيل البيبلوغرافية
العنوان: Re-defining reliability assessment per new intra-via Cu leakage degradation
المؤلفون: Song, W.S., Lee, C.S., Park, K.C., Suh, B.S., Kim, J.W., Kim, S.Y., Wee, Y.J., Choi, S.M., Kang, H.-K., Kim, S.U., Suh, K.P.
المصدر: 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) VLSI technology VLSI Technology, 2002. Digest of Technical Papers. 2002 Symposium on. :222-223 2002
Relation: 2002 Symposium on VLSI Technology Digest of Technical Papers
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:078037312X
9780780373129
DOI:10.1109/VLSIT.2002.1015462