Simulation and Metrological Applications for RDL Patterning Development of Glass Substrate

التفاصيل البيبلوغرافية
العنوان: Simulation and Metrological Applications for RDL Patterning Development of Glass Substrate
المؤلفون: Lee, Chang-Chun, Chuang, Jui-Chang, Yang, Chen-Tsai, Li, Chung-I-I, Lee, Shih-Hsien, Kuo, Shih-Hao
المصدر: 2024 IEEE 74th Electronic Components and Technology Conference (ECTC) ECTC Electronic Components and Technology Conference (ECTC), 2024 IEEE 74th. :990-995 May, 2024
Relation: 2024 IEEE 74th Electronic Components and Technology Conference (ECTC)
قاعدة البيانات: IEEE Xplore Digital Library