Oxide Reliability of Gate Biased Trench Si-IGBTs Irradiated with Protons and Neutrons

التفاصيل البيبلوغرافية
العنوان: Oxide Reliability of Gate Biased Trench Si-IGBTs Irradiated with Protons and Neutrons
المؤلفون: Spejo, Lucas B., Rehm, Silvan, Novak, Vladimir, Ammann, Benedict, Wursch, Philippe, Stark, Roger, Knoll, Lars, Schulz, Nicola, Minamisawa, Renato A.
المصدر: 2024 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD) Power Semiconductor Devices and ICs (ISPSD), 2024 36th International Symposium on. :60-63 Jun, 2024
Relation: 2024 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9798350394825
تدمد:19460201
DOI:10.1109/ISPSD59661.2024.10579671