SiGe:C BiCMOS technology with 3.6 ps gate delay

التفاصيل البيبلوغرافية
العنوان: SiGe:C BiCMOS technology with 3.6 ps gate delay
المؤلفون: Rucker, H., Heinemann, B., Barth, R., Bolze, D., Drews, J., Haak, U., Hoppner, W., Knoll, D., Kopke, K., Marschmeyer, S., Richter, H.H., Schley, P., Schmidt, D., Scholz, R., Tillack, B., Winkler, W., Wulf, H.-E., Yamamoto, Y.
المصدر: IEEE International Electron Devices Meeting 2003 Electron devices IEDM'03 Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International. :5.3.1-5.3.4 2003
Relation: IEEE International Electron Devices Meeting 2003
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:0780378725
9780780378728
DOI:10.1109/IEDM.2003.1269180