Optimization and reliability characteristics of TiO/sub 2//HfO/sub 2/ multi-metal dielectric MOSFETs

التفاصيل البيبلوغرافية
العنوان: Optimization and reliability characteristics of TiO/sub 2//HfO/sub 2/ multi-metal dielectric MOSFETs
المؤلفون: Se Jong Rhee, Hyoung-Sub Kim, Chang Yong Kang, Chang Hwan Choi, Manhong Zhang, Feng Zhu, Tackhwi Lee, Injo Ok, Akbar, M.S., Krishnan, S.A., Lee, J.C.
المصدر: Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. VLSI Technology VLSI Technology, 2005. Digest of Technical Papers. 2005 Symposium on. :168-169 2005
Relation: 2005 Symposium on VLSI Technology
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:4900784001
9784900784000
تدمد:07431562
21589682
DOI:10.1109/.2005.1469254