دورية أكاديمية
A novel approach for the patterning and high-volume production of sub-40-nm gates
| العنوان: | A novel approach for the patterning and high-volume production of sub-40-nm gates |
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| المؤلفون: | Romero, K., Stephan, R., Grasshoff, G., Mazur, M., Ruelke, H., Huy, K., Klais, J., McGowan, S., Dakshina-Murthy, S., Bell, S., Wright, M. |
| المصدر: | IEEE Transactions on Semiconductor Manufacturing IEEE Trans. Semicond. Manufact. Semiconductor Manufacturing, IEEE Transactions on. 18(4):539-545 Nov, 2005 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | تدمد: | 08946507 15582345 |
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| DOI: | 10.1109/TSM.2005.858518 |