Selective Oxide (SelOx) Deposition as Unique Gap-Fill Solution for Shallow Trench Isolation

التفاصيل البيبلوغرافية
العنوان: Selective Oxide (SelOx) Deposition as Unique Gap-Fill Solution for Shallow Trench Isolation
المؤلفون: Lindemann, H. M., Radecker, J., Sperlich, H.-P.
المصدر: 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI. :253-258 Jun, 2007
Relation: 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:1424406528
9781424406524
1424406536
9781424406531
تدمد:10788743
23766697
DOI:10.1109/ASMC.2007.375111