Low resistive tungsten dual polymetal gate process for high speed and high density memory devices

التفاصيل البيبلوغرافية
العنوان: Low resistive tungsten dual polymetal gate process for high speed and high density memory devices
المؤلفون: Yong Soo Kim, Kwan-Yong Lim, Min-Gyu Sung, Soo-Hyun Kim, Hong-Seon Yang, Heung-Jae Cho, Se-Aug Jang, Jae-Geun Oh, Kwangok Kim, Young-Kyun Jung, Tae-Woo Jung, Choon-Hwan Kim, Doek-Won Lee, Won Kim, Young-Hoon Kim, Kang-Sik Choi, Tae-Kyung Oh, Yun-Taek Hwang, Seung-Ho Pyi, Ja-chun Ku, Jin-Woong Kim
المصدر: ESSDERC 2007 - 37th European Solid State Device Research Conference Solid State Device Research Conference, 2007. ESSDERC 2007. 37th European. :259-262 Sep, 2007
Relation: ESSDERC 2007 - 37th European Solid State Device Research Conference
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424411238
9781424411245
تدمد:19308876
23786558
DOI:10.1109/ESSDERC.2007.4430927