مؤتمر
DFM Challenges for 32nm Node with Double Dipole Lithography (DDL) and Double Patterning Technology (DPT)
| العنوان: | DFM Challenges for 32nm Node with Double Dipole Lithography (DDL) and Double Patterning Technology (DPT) |
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| المؤلفون: | Chen, J. Fung, Staud, Wolf, Arnold, Bill |
| المصدر: | 2006 IEEE International Symposium on Semiconductor Manufacturing Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on. :479-482 Sep, 2006 |
| Relation: | 2006 International Symposium on Semiconductor Manufacturing (ISSM) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9784990413804 |
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| تدمد: | 1523553X |
| DOI: | 10.1109/ISSM.2006.4493141 |