مؤتمر
DFM Challenges for 32nm Node with Double Dipole Lithography (DDL) and Double Patterning Technology (DPT)
العنوان: | DFM Challenges for 32nm Node with Double Dipole Lithography (DDL) and Double Patterning Technology (DPT) |
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المؤلفون: | Chen, J. Fung, Staud, Wolf, Arnold, Bill |
المصدر: | 2006 IEEE International Symposium on Semiconductor Manufacturing Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on. :479-482 Sep, 2006 |
Relation: | 2006 International Symposium on Semiconductor Manufacturing (ISSM) |
قاعدة البيانات: | IEEE Xplore Digital Library |
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