Atomic Layer Deposition (ALD) Tungsten NEMS Devices via a Novel Top-Down Approach

التفاصيل البيبلوغرافية
العنوان: Atomic Layer Deposition (ALD) Tungsten NEMS Devices via a Novel Top-Down Approach
المؤلفون: Davidson, B.D., Chang, Y.J., Seghete, D., George, S.M., Bright, V.M.
المصدر: 2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on. :120-123 Jan, 2009
Relation: 2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems (MEMS)
قاعدة البيانات: IEEE Xplore Digital Library
الوصف
ردمك:9781424429776
9781424429783
تدمد:10846999
DOI:10.1109/MEMSYS.2009.4805333