مؤتمر
Ultra-shallow Carborane molecular implant for 22-nm node p-MOSFET performance boost
| العنوان: | Ultra-shallow Carborane molecular implant for 22-nm node p-MOSFET performance boost |
|---|---|
| المؤلفون: | Colombeau, B., Thanigaivelan, T., Arevalo, E., Toh, T., Miura, R., Ito, H. |
| المصدر: | 2009 International Workshop on Junction Technology Junction Technology, 2009. IWJT 2009. International Workshop on. :27-30 Jun, 2009 |
| Relation: | 2009 International Workshop on Junction Technology (IWJT) |
| قاعدة البيانات: | IEEE Xplore Digital Library |
Full Text Finder | ردمك: | 9781424433193 9781424433209 |
|---|---|
| DOI: | 10.1109/IWJT.2009.5166211 |