دورية أكاديمية
In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography
العنوان: | In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography |
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المؤلفون: | Tay, A., Ho, W. K., Wu, X., Chen, X. |
المصدر: | IEEE Transactions on Instrumentation and Measurement IEEE Trans. Instrum. Meas. Instrumentation and Measurement, IEEE Transactions on. 58(12):3978-3984 Dec, 2009 |
قاعدة البيانات: | IEEE Xplore Digital Library |
تدمد: | 00189456 15579662 |
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DOI: | 10.1109/TIM.2009.2021620 |