دورية أكاديمية
In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography
| العنوان: | In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography |
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| المؤلفون: | Tay, A., Ho, W. K., Wu, X., Chen, X. |
| المصدر: | IEEE Transactions on Instrumentation and Measurement IEEE Trans. Instrum. Meas. Instrumentation and Measurement, IEEE Transactions on. 58(12):3978-3984 Dec, 2009 |
| قاعدة البيانات: | IEEE Xplore Digital Library |
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